Heating plate capable of fast and fine adjusting space distribution of temperature field and control method thereof

Abstract

The invention relates to a heating plate capable of fast and fine adjusting the space distribution of a temperature field and a control method thereof, and belongs to the technical field of fine adjusting of the heating plate. A plurality of heat insulation layers are arranged on a metallic matrix of the heating plate, and the heat insulation layers divide the metallic matrix of the heating plate into annular or sector areas with different diameters. A plurality of temperature sensors, heating rods and cooling devices are arranged in the annular or sector areas divided by the heat insulation layers in the metallic matrix of the heating plate respectively. A control module is used for controlling the heating rods to heat or the cooling devices to conduct refrigeration, and the temperature space distribution is precisely controlled to be close to the expected requirement for the temperature space distribution. According to the heating plate capable of fast and fine adjusting the space distribution of the temperature field and the control method thereof, through the heat insulation layers, the heat diffusion effect of adjacent areas is reduced, control over different areas is more independent, then heating and cooling devices which are independent and controllable are arranged in different areas, two-way quick adjusting of the temperature in the areas is achieved, and finally the capacity of two-way, quick, flexible and fine adjusting of the space distribution of the temperature field is achieved.

Description

technical field [0001] The invention relates to a heating plate capable of rapidly and finely adjusting the spatial distribution of a temperature field and a control method thereof, belonging to the fine control technical field of the heating plate. Background technique [0002] Temperature control has important applications in many fields. The current temperature control is mostly aimed at adjusting the average temperature of the space, but in many occasions, it is necessary to quickly and finely adjust the spatial distribution of the temperature field. The online real-time control of chemical vapor deposition puts forward requirements for the rapid and fine control of the spatial distribution of the temperature field. [0003] Chemical vapor deposition (CVD) is a process technology in which reactant substances react chemically under gaseous conditions to generate solid substances and deposit them on the surface of a heated solid substrate to obtain solid materials. It is r...

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Problems solved by technology

This actually requires the equipment to have more precise control over the spatial distribution of process factors. However, the existing CVD chamber design is generally too rigid, and can only adjust the average value of process factors, and cannot flexibly control the spatial distribution of process factors. , the process quality is guaranteed by simple structure and rough process condition control, which leads to relatively poor adaptability of equipment to different process requirements and adjustment and correction capabilities of process deviations. At the same time, it is impossible to achieve fine spatial distribution of process quality. regulation

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