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Preparation method of tiny graph

A graphics and tiny technology, which is applied in the field of micro graphics preparation, can solve the problems of difficulty in making small-scale graphics and complicated processes, and achieve the effect of simple micro graphics preparation technology and large-area production

Inactive Publication Date: 2014-06-04
SICHUAN WINDOM PHOTOELECTRIC TECH
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  • Abstract
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AI Technical Summary

Problems solved by technology

[0004] The technical problem to be solved by the present invention: Aiming at the existing microstructure preparation technology requiring large-scale equipment, complicated process and difficulties in making small-scale graphics, a method for preparing micro-figures is provided, which does not require large-scale equipment Prepare photolithographic masks, and also greatly simplify the preparation process of continuous surface microstructures

Method used

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  • Preparation method of tiny graph
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  • Preparation method of tiny graph

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0028] (1) Coating the photosensitive surface on the surface of the glass substrate;

[0029] (2) A microlens array is placed above the substrate coated with the photosensitive surface

[0030] (3) Set the mask of the grayscale pattern above the microlens array such as figure 2 ;

[0031] (4) An ultraviolet lamp is set above the mask pattern as an exposure light source for the mask pattern. The whole exposure system such as image 3 As shown, 1 in the figure represents the glass substrate, 2 represents the photosensitive surface, 3 represents the microlens array, and 4 represents the mask;

[0032] (5) Turn on the ultraviolet light source to perform reduced projection exposure on the mask pattern to realize nested lithography on the photosensitive surface.

[0033] (6) Take out the substrate and develop it to obtain the required tiny structure; Figure 4 As shown, 1 in the figure represents the glass substrate, and 2 represents the tiny structure of the corresponding mat...

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Abstract

The invention relates to a preparation method of a tiny graph. The method comprises the steps of coating a light-sensitive surface on the surface of a substrate, and arranging a microlens array above the light-sensitive surface; arranging a tiny graph mask above the microlens array; arranging an ultraviolet lamp light source above the mask; when an ultraviolet lamp is turned on, realizing nested photoetching of the light-sensitive surface by the reduced exposure for masked graph; finally, taking out the substrate coated with the light-sensitive surface, and developing to obtain the needed tiny structure. After the method is adopted, the tiny graph and a large-area structure can be manufactured.

Description

technical field [0001] The invention belongs to the technical field of micro-figure processing, in particular to a micro-figure preparation method. Background technique [0002] Micro-optics is a new discipline that studies the design and manufacturing process of optical components with micron and nanometer dimensions, and the theory and technology of using such components to realize the emission, transmission, transformation and reception of light waves. Lightweight, low cost and other advantages. In recent years, with the development of micro-optics and micro-nano processing technology, binary optical components (devices) have many excellent functions in realizing light wave conversion, which are difficult for traditional optics, and are conducive to promoting the development of optical systems. The realization of miniaturization, arrayization and integration has opened up a new vision in the field of optics. Binary optics refers to the theory of diffraction based on lig...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/00
Inventor 张宜文吴松胡玲
Owner SICHUAN WINDOM PHOTOELECTRIC TECH
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