Focusing and levelling device and method

A technology of focusing and leveling device and spatial light modulator, which is applied in the field of equipment in the field of integrated circuit manufacturing, can solve the problems of spot ghosting, measurement accuracy cannot be guaranteed, and affect the surface morphology of glass substrates, etc., to improve detection The effect of precision, flexible modulation and strong adaptability

Active Publication Date: 2014-06-04
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
View PDF7 Cites 8 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] The disadvantage of the above-mentioned patents is that if the substrates are glass substrates of different thicknesses, the photodetector may detect two images formed by the light beam through the upper surface and the lower surface of the glass substrate respectively, that is, the zero-order light (on the substrate) The image formed by the light reflected on the surface) and the image formed by the primary light (the light reflected by the lower surface of the substrate) will produce the phenomenon of spot ghosting, which will affect the surface topography of the glass substrate detected by the detector, resulting in inaccurate measurement accuracy. guaranteed
However, this method cannot completely solve the above problems

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Focusing and levelling device and method
  • Focusing and levelling device and method
  • Focusing and levelling device and method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0031] The focusing and leveling device and method provided by the present invention will be further described in detail below with reference to the accompanying drawings and specific embodiments. Advantages and features of the present invention will be apparent from the following description and claims. It should be noted that all the drawings are in a very simplified form, and are only used for the purpose of conveniently and clearly assisting in describing the embodiments of the present invention.

[0032] The present invention provides a focusing and leveling device, please refer to figure 2 ,include:

[0033] An illumination unit consisting of a light source 101, an illumination mirror group 102, and an optical fiber. After the light emitted by the light source 101 is concentrated by the illumination mirror group 102, it is emitted by the optical fiber to form a measurement spot for measurement;

[0034] A projection unit, the projection unit includes a spatial light m...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
Login to view more

Abstract

The invention provides a focusing and levelling device and method. A spatial light modulator is adopted to ensure that a measurement light spot can be modulated according to the thickness of a substrate, the size of the measurement light spot is changed, and the phenomenon of ghosting of the detection light spot is prevented from generating, thus the detection precision is improved, and further the focusing and levelling device has high adaptability to the substrate; the focusing and levelling device is flexible in modulation and convenient and reliable.

Description

technical field [0001] The invention relates to equipment in the field of integrated circuit manufacturing, in particular to a focusing and leveling device and a focusing and leveling method applied in projection photolithography technology. Background technique [0002] In today's projection lithography system, due to the thickness deviation of the substrate, the surface fluctuation and the uncertainty of the position of the projection objective lens and the focal plane, the substrate will be defocused or tilted relative to the focal plane of the objective lens, which will affect the quality of the integrated circuit Therefore, it usually includes a focusing and leveling system to accurately detect the position and inclination of the surface of the measured object, so that the substrate is in a better position during the exposure process. [0003] Obviously, the non-contact focusing and leveling device is the first choice. At present, the commonly used non-contact focusing ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20G03F9/00G01B11/00G01B11/25
Inventor 陆侃杨志勇
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products