Reflection type monitoring device for laser micro processing process

A monitoring device and micro-machining technology, applied in laser welding equipment, metal processing equipment, manufacturing tools, etc., can solve the problems that the changes of key micro-nano structures cannot be significantly prompted, the monitoring system is complicated, and the monitoring cost is expensive, and the structure is achieved. Simple, small amount of collected data, and fast collection speed

Inactive Publication Date: 2014-07-16
WENZHOU UNIVERSITY
View PDF5 Cites 5 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This type of monitoring system is too complex, and the monitoring cost is too expensive, especially the data collected by monitoring is two-dimensional image data or even video data stream, resulting in a large amount of data
In addition, during the processing, the change of the key micro-nano structure of the material cannot be significantly prompted

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Reflection type monitoring device for laser micro processing process
  • Reflection type monitoring device for laser micro processing process

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0014] see figure 1 , a reflective monitoring device for a laser micromachining process disclosed by the present invention, comprising a helium-neon laser 1, a detection laser beam 11 emitted from the front end of the helium-neon laser 1 is provided with a workpiece 2 on the emission line, and the workpiece 2 A first photoelectric probe 3 is arranged on the reflection line of the detection laser beam 11, and a laser beam splitter 4 is arranged in the middle of the emission line of the detection laser beam 11 at the front end of the helium-neon laser 1, through which the detection laser beam 11 is specifically It is divided into a reference signal 41 and a reflected light signal 42. The reflected light signal 42 enters the first photoelectric probe 3 after being reflected by the workpiece 2. The front end of the reference light signal 41 is provided with a second photoelectric probe 5, and the reference light signal 41 directly enters the first photoelectric probe 3. Two photoe...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses a reflection type monitoring device for a laser micro processing process. The reflection type monitoring device comprises a helium-neon laser. A workpiece is arranged on an emission line of a detection laser beam emitted from the front end of the helium-neon laser, a first photoelectric probe is arranged on a reflection line of the detection laser beam of the workpiece, a laser splitting piece is arranged in the middle of the emission line of the detection laser beam at the front end of the helium-neon laser and specifically divides the detection laser beam into a reference signal and a reflected light signal, the reflected light signal enters the first photoelectric probe after being reflected by the workpiece, a second photoelectric probe is arranged at the front end of a reference light signal which directly enters the second photoelectric probe, a first data line is fixedly arranged on the first photoelectric probe, a second data line is fixedly arranged on the second photoelectric probe, and an oscilloscope is arranged between the first data line and the second data line. According to the technical scheme, the reflection type monitoring device is simple in structure, high in applicability, low in cost, small in collected data size and high in collection speed.

Description

technical field [0001] The invention relates to the technical field of laser micromachining, in particular to a reflective monitoring device for the laser micromachining process. Background technique [0002] At present, CCD cameras are commonly used in the process of laser micromachining for on-site shooting and monitoring. In the high-precision micromachining process, it is even necessary to operate under a microscope to ensure the processing quality. This kind of monitoring system is too complicated and the monitoring cost is too expensive, especially the data collected by monitoring is two-dimensional image data or even video data stream, resulting in too large amount of data. In addition, during the processing, the changes in the key micro-nano structure of the material cannot be significantly prompted. Contents of the invention [0003] In view of the deficiencies in the prior art, the object of the present invention is to provide a reflective monitoring device for...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): B23K26/03B23K26/70B23K26/00
CPCB23K26/03B23K26/361
Inventor 尉鹏飞王楠田其立朱海永黄晓虹黄运米金清理杨光参
Owner WENZHOU UNIVERSITY
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap