TFT (Thin Film Transistor) glass thinning pretreatment method

A thinning treatment and pretreatment technology, applied in the field of TFT glass thinning pretreatment, can solve the problems of surface pits, difficult control, long chemical etching time, etc.

Active Publication Date: 2014-07-30
SUZHOU CRANE OPTOELECTRONICS TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

With the development of the industry, TFT displays are becoming more and more ultra-thin, and even thinned to 0.3mm thickness on both sides. The thinning process requires longer chemical etching time. This method gradually shows the following disadvantages: 1. .It takes a long time to polish the pits on the surface of the glass after etching; 2. The polishing material leads to an increase in cost and low efficiency, and the abnormality is difficult to control

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0018] The raw material is the TFT glass panel of the same manufacturer and batch of TFT glass AN100, the thickness of which is 1.000mm, and the size is 730mm×920mm. The etching and polishing equipment used are respectively Dongguan Hongcun etching machine and Hunan Yongchuang polishing machine.

[0019] Step 1: Inject 900L of 80% concentrated sulfuric acid into a closed storage tank container through a pump, then inject 50L of 30% concentrated hydrochloric acid, and finally add 50L of 50% hydrofluoric acid;

[0020] Step 2: Heat to 28-30°C in a closed storage tank container while bubbling and stirring evenly;

[0021] Step 3: Put the mixed acid into the acid tank of the etching machine, and keep bubbling and stirring for 30-60 minutes evenly;

[0022] Step 4: Soak 5 pieces of TFT substrates A, B, C, D, and E in the mixture for 15 minutes, and remove the double layer of 60 microns on the glass surface;

[0023] Step 5: Wash the glass surface with clean water, then enter the ...

Embodiment 2

[0029] The raw material is the same batch of TFT glass panels from the same manufacturer as Corning Glass, with a thickness of 1.000mm and a size of 730mm×920mm. The etching and polishing equipment used are respectively Dongguan Hongcun etching machine and Hunan Yongchuang polishing machine.

[0030] Step 1: Inject 900L of 80% concentrated sulfuric acid into a closed storage tank container through a pump, then inject 50L of 30% concentrated hydrochloric acid, and finally add 50L of 50% hydrofluoric acid;

[0031] Step 2: Heat to 28-30°C in a closed storage tank container while bubbling and stirring evenly;

[0032] Step 3: Put the mixed acid into the acid tank of the etching machine, and keep bubbling and stirring for 30-60 minutes evenly;

[0033] Step 4: Soak 5 pieces of TFT substrates A, B, C, D, and E in the mixture for 15 minutes, and remove the double layer of 60 microns on the glass surface;

[0034] Step 5: Wash the glass surface with clean water, then enter the hydr...

Embodiment 3

[0041] The raw material is the TFT glass panel of the same manufacturer and batch of TFT glass AN100, the thickness of which is 1.000mm, and the size is 730mm×920mm. The etching and polishing equipment used are respectively Dongguan Hongcun etching machine and Hunan Yongchuang polishing machine.

[0042] Step 1: Inject 950L of 80% concentrated sulfuric acid into a closed storage tank container through a pump, then inject 30L of 30% concentrated hydrochloric acid, and finally add 50L of 50% hydrofluoric acid;

[0043] Step 2: Heat to 28-30°C in a closed storage tank container while bubbling and stirring evenly;

[0044] Step 3: Put the mixed acid into the acid tank of the etching machine, and keep bubbling and stirring for 30-60 minutes evenly;

[0045] Step 4: Soak 5 pieces of TFT substrates A, B, C, D, and E in the mixture for 15 minutes, and remove the double layer of 60 microns on the glass surface;

[0046] Step 5: Wash the glass surface with clean water, and then enter ...

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PUM

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Abstract

The invention provides a TFT (Thin Film Transistor) glass thinning pretreatment method, which comprises the following steps: injecting mixed acid liquor of concentrated sulfur acid, concentrated hydrochloric acid and hydrofluoric acid into an airtight container; heating the mixed acid liquor to 28-30DEG C and bubbling and evenly mixing; injecting the mixed acid liquor into etching equipment, continuously bubbling and mixing for 30-60 minutes until mixing evenly; soaking TFT glass to be-thinned in the mixed solution for 15-60 minutes, so as to remove the double layers of a glass surface by 50-80micrometers; washing and moisturizing the TFT glass, and thinning in the hydrofluoric acid etching solution. Pits in the surface of a pretreated TFT glass panel are reduced, the depths of the pits are shallower and size is obviously reduced in comparison with pits of the glass which is not treated or etched, and indirectly the polishing time can be shortened by 50-80% through the same machine platform under the same conditions, even the effect of no need of polishing can be achieved.

Description

technical field [0001] The invention relates to a thinning pretreatment method of TFT glass, which can suppress the depth and size of pits on the surface of the thinned TFT glass, reduce the time of post-process grinding, thereby reducing the cost of post-process grinding and improving the Process grinding productivity. Background technique [0002] Currently, liquid crystal TFT display mainly adopts the method of chemical thinning, and its main features are short thinning time, large production output and simple process; currently all thinning manufacturers use hydrofluoric acid directly or add other organic active agents Etching is performed. With the development of the industry, TFT displays are becoming more and more ultra-thin, and even thinned to 0.3mm thickness on both sides. The thinning process requires longer chemical etching time. This method gradually shows the following disadvantages: 1. .After the glass is etched, pits appear on the surface and need to be pol...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C03C15/00
Inventor 李高贵
Owner SUZHOU CRANE OPTOELECTRONICS TECH
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