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Photoetching projection objective environment collection control system and control method thereof

A technology of environmental acquisition and lithography projection, which is used in microlithography exposure equipment, photolithographic process exposure devices, etc., can solve the problems of thermal power influence, ultra-high precision requirements, long-distance signal attenuation of sensor analog signals, etc. effect of time

Inactive Publication Date: 2014-09-10
CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI
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Problems solved by technology

[0004] In order to solve the technical problems in the prior art that the thermal power of the control box affects the imaging quality, the long-distance signal attenuation of the sensor analog signal, and the temperature, pressure, cleanliness response time and ultra-high precision requirements in the lithography system, the present invention proposes an optical Engraved projection objective lens environment acquisition control system and control method thereof

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  • Photoetching projection objective environment collection control system and control method thereof
  • Photoetching projection objective environment collection control system and control method thereof

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Embodiment Construction

[0018] Embodiments of the present invention will be further described below in conjunction with the accompanying drawings.

[0019] Such as figure 1 As shown, the lithography projection objective environment acquisition control system of the present invention includes a control cabinet 1 , an acquisition drive cabinet 4 , an analog-to-digital conversion cabinet 15 , various actuators 8 and various sensors 17 . Various actuators 8 include solenoid valves, pressure reducing valves, etc., and various sensors 17 include 4 temperature sensors, 3-4 pressure sensors, 2-3 flow sensors, and the like.

[0020] The control cabinet 1 includes a standard VME backplane 10, a main control board 11 and an optical fiber communication board 2, and the main control board 11 and the optical fiber communication board 2 are inserted on the standard VME backplane 10, so The collection drive chassis 4 includes a non-standard VME backplane 12, an environment control algorithm board 13 and an environm...

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Abstract

The invention relates to a photoetching projection objective environment collection control system and a control method thereof, belonging to the field of photoetching projection objective control. The photoetching projection objective environment collection control system comprises a control machine box, a collection driving machine box, an analog-to-digital conversion machine box, multiple actuators and multiple sensors, wherein an optical fiber communication board card is connected with an environmental control algorithm board card through an optical fiber transmission link; an environment collection driving board card is connected with an analog-to-digital conversion board card or an interface conversion card through a digital signal transmission link, and the environment collection driving board card is connected with the multiple actuators through a driving signal transmission link; the analog-to-digital conversion board card is connected with the multiple sensors through a low-voltage analog signal transmission link; the multiple actuators are arranged in a photoetching machine environment cabinet; the multiple sensors are arranged on a photoetching projection objective. According to the photoetching projection objective environment collection control system disclosed by the invention, the regulation time of every regulation is shortened, the accuracy of environmental parameter regulation is ensured, the response time is shortened and the integral property of the photoetching projection objective and a photoetching machine can be ensured.

Description

technical field [0001] The invention belongs to the field of lithography projection objective lens control, and in particular relates to a lithography projection objective lens environment acquisition control system and a control method thereof. Background technique [0002] The lithography projection objective lens is an ultra-precision optical system, which is the core component of the lithography machine, and it is the key to the lithography resolution and line width. With the improvement of lithography precision, the requirements for the environment, such as the requirements for ambient temperature, air pressure, and cleanliness, are becoming more and more stringent. There are a lot of heat sources inside the objective lens, including various motors and excimer lasers, etc. Changes in temperature will cause changes in the focal plane position of the objective lens and affect the imaging quality of the objective lens. At the same time, the inside of the objective lens nee...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20
Inventor 崔洋李佩玥于淼彭吉隋永新杨怀江
Owner CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI
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