Preparation of hydrotalcite nanosheet/carbon array/metal/silicon combined electrode and application of hydrotalcite nanosheet/carbon array/metal/silicon combined electrode as non-enzymatic sensor

A nanosheet and hydrotalcite technology, which is applied in the field of electrochemical biosensor preparation, can solve the problems of unsuitability for large-scale popularization and application, increased operation difficulty, and many uncertain factors, and achieves good preparation reproducibility and detection stability. , the effect of improving electrical conductivity and improving catalytic activity

Active Publication Date: 2017-01-04
深圳市容大感光科技股份有限公司 +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, there are many uncertain factors in the gluing and carbonization process of the first step, which ensures the smoothness and smoothness of the substrate

Method used

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  • Preparation of hydrotalcite nanosheet/carbon array/metal/silicon combined electrode and application of hydrotalcite nanosheet/carbon array/metal/silicon combined electrode as non-enzymatic sensor
  • Preparation of hydrotalcite nanosheet/carbon array/metal/silicon combined electrode and application of hydrotalcite nanosheet/carbon array/metal/silicon combined electrode as non-enzymatic sensor
  • Preparation of hydrotalcite nanosheet/carbon array/metal/silicon combined electrode and application of hydrotalcite nanosheet/carbon array/metal/silicon combined electrode as non-enzymatic sensor

Examples

Experimental program
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Effect test

Example Embodiment

[0033] Example 1:

[0034] (1) Place the silicon wafer in acetone, ethanol, and secondary water for 20 minutes. After rinsing with acetone, use N 2 Blow dry; take the treated silicon wafer as the base, use metal sputtering technology, deposit metal platinum under the current condition of 5mA for 120s, obtain a uniform and flat platinum layer on the surface of the silicon wafer, and obtain a platinum / silicon base material;

[0035] (2) In the ultra-clean room, using platinum / silicon wafer as the base material, spin-coating SU-8 2050 photoresist with a thickness of 70 μm, self-leveling for 30 minutes at 23°C and 50% relative humidity Put it on a drying table for pre-baking, first drying at 65°C for 20 minutes, then drying at 95°C for 30 minutes, and finally cooling at a temperature of 23°C and a relative humidity of 50% for 40 minutes to obtain a photoresist film ; Use a mask with neatly arranged light-transmitting areas for exposure, wherein the pattern of the light-transmitti...

Example Embodiment

[0044] Example 2:

[0045] (1) The silicon wafer was sonicated in acetone, ethanol, and secondary water for 20 minutes in turn, rinsed with acetone, and then rinsed with N 2 Blow dry; take the treated silicon wafer as the base, use metal sputtering technology, deposit metal gold under the current condition of 5mA for 180s, obtain a uniform and flat gold layer on the surface of the silicon wafer, and obtain the gold / silicon base material;

[0046] (2) In a clean room, using gold / silicon wafer as the base material, spin-coating SU-8 2050 photoresist with a thickness of 90 μm, self-leveling for 30 minutes at 23°C and 50% relative humidity Place it on a drying table for pre-baking, first drying at 65°C for 20 minutes, then drying at 95°C for 30 minutes, and finally cooling for 30 minutes at a temperature of 23°C and a relative humidity of 50% to obtain a photoresist film ;Use a mask with neatly arranged light-transmitting areas for exposure, wherein the pattern of the light-trans...

Example Embodiment

[0054] Example 3:

[0055] (1) The silicon wafer was sonicated in acetone, ethanol, and secondary water for 20 minutes in turn, rinsed with acetone, and then rinsed with N 2 Blow dry; take the treated silicon wafer as the base, use metal sputtering technology, deposit metal platinum under the current condition of 5mA for 180s, obtain a uniform and flat platinum layer on the surface of the silicon wafer, and obtain a platinum / silicon base material;

[0056] (2) In the ultra-clean room, using platinum / silicon wafer as the base material, spin-coating SU-8 2050 photoresist with a thickness of 80 μm, and self-leveling for 30 minutes at 23°C and 50% relative humidity Place it on a drying table for pre-baking, first drying at 65°C for 20 minutes, then drying at 95°C for 30 minutes, and finally cooling for 30 minutes at a temperature of 23°C and a relative humidity of 50% to obtain a photoresist film ; Expose using a mask with neatly arranged light-transmitting areas, where the patte...

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Abstract

The invention discloses preparation of a hydrotalcite nanosheet/carbon array/metal/silicon combined electrode and application of the hydrotalcite nanosheet/carbon array/metal/silicon combined electrode as a non-enzymatic sensor. A substrate material is processed by combining a C-MEMS micro-manufacturing technology and a metal sputtering technology, and the surface of the substrate material is modified with nanosheet to prepare the hydrotalcite nanosheet/carbon array/metal/silicon combined electrode, and non-enzymatic electrochemical sensor is constructed for quantitative determination of glucose. By the metal sputtering technology, electrical conductivity of silicon chip is enhanced, and smoothness and flatness of the surface will not be destroyed, and imaging quality of the subsequent micromachining material will not be influenced. The C-MEMS micromachining technology can be directly applied in preparation of electrochemical devices. The nanosheet exposes more active laminates in comparison with a micron-grade layered material and is self-assembled to cover the surface of the substrate so as to increase roughness and raise catalytic activity. Electrochemical detection shows that the composite material constructed sensor can be used for accurate and quantitative determination of glucose and has good preparation reproducibility and detection stability.

Description

technical field [0001] The invention belongs to the technical field of preparation of electrochemical biosensors, in particular to the preparation of a hydrotalcite nanosheet / carbon array / metal / silicon composite electrode and its application as an enzyme-free sensor. Background technique [0002] Enzyme-free sensors based on inorganic materials with electrocatalytic activity, because they do not rely on enzyme molecules, fundamentally overcome the disadvantages of enzyme sensors such as environmental sensitivity, high price, and complicated immobilization, and inject fresh blood into the research and development of electrochemical sensors. . Metal oxides and hydroxides, alloys, carbon materials, etc., are often catalyzed on the electrode surface of enzyme-free sensors. During the detection process, redox reactions occur between the above-mentioned inorganic materials and some small molecules. Through the strength of the reaction signal, the measured qualitative and quantita...

Claims

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Application Information

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IPC IPC(8): G01N27/327
Inventor 海波邹应全杨遇春晏凯
Owner 深圳市容大感光科技股份有限公司
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