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A three-degree-of-freedom precision adjustment device based on eccentric structure

A technology of precision adjustment and eccentric structure, which is applied in the direction of manipulators, program-controlled manipulators, manufacturing tools, etc., can solve the problems of large space occupation, mechanism crawling phenomenon, and gaps in kinematic pairs, and achieve small motion resistance, easy assembly and adjustment, Fast response effect

Inactive Publication Date: 2015-09-02
ZHEJIANG UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The traditional parallel pose adjustment structure uses general kinematic pairs to form the branch chain of the parallel mechanism. Such an adjustment mechanism has three disadvantages, namely: the traditional parallel structure occupies a large space, there are gaps in the kinematic pairs, and the mechanism crawls within the range of micro-displacement.

Method used

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  • A three-degree-of-freedom precision adjustment device based on eccentric structure
  • A three-degree-of-freedom precision adjustment device based on eccentric structure
  • A three-degree-of-freedom precision adjustment device based on eccentric structure

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Embodiment Construction

[0030] The present invention will be further described below in conjunction with the accompanying drawings and embodiments.

[0031] Such as figure 1 , figure 2 As shown, the present invention S2 is installed between the main board 1 and the immersion unit S3, the optical system S1 runs through the main board 1, the present invention S2 and the immersion unit S3, and exposes the lowermost silicon wafer 3 through the immersion flow field 2 . S2 of the present invention is installed on the main board 1 through the mounting hole 4A of the mounting base plate using mounting bolts 4C to adjust, locate and monitor the position of the mounting base plate 4, and the immersion unit S3 is installed on the lower end surface of the motion platform 8 through the immersion unit mounting hole 8A.

[0032] Such as figure 2 , image 3 As shown, the present invention S2 includes three preloading components 12, a positioning component, three horizontal displacement measurement components 1...

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Abstract

The invention discloses a three freedom precision control apparatus based on an eccentric structure. Three supporting arms are extended along the radial direction of a motion platform uniformly arranged along a peripheral face, eccentric circular holes are respectively arranged on ends of the three supporting arms, and the eccentric holes of the three supporting arms are connected to a mounting substrate through motion branch chains with the same structure; preloading and locating components for locating the mounting substrate are mounted under the surface of a main board, the locating components and three preloading components are surrounded around the sides of the mounting substrate among the motion branch chains, three horizontal displacement measuring components are fixedly mounted under the surface of the main board on the side of the locating component. Through the three freedom precision control apparatus, submerged units of a submerged photo-etching machine are mounted and their spatial positions are adjusted so as to realize submicron location of the submerged units; the three freedom precision control apparatus is characterized by high rigidity, wide regulation range, quick motion response, modular design, compact structure, and simple assembly and adjustment, thus the control apparatus can be applied to three freedom precision control under other occasions excluding the submerged photo-etching machine.

Description

technical field [0001] The invention relates to a three-degree-of-freedom adjustment device, in particular to a three-degree-of-freedom precision adjustment device based on an eccentric structure. Background technique [0002] In an immersion lithography machine, there is an immersion flow field between the last projection objective and the silicon wafer. The immersion flow field is generated by the immersion unit, and in order to prevent the leakage of the immersion flow field, the gap between the immersion unit and the silicon wafer is required to be within 1mm, and there is a strict parallelism requirement for the gap; The unit performs a series of motion controls, and in the motion control of the immersion unit, it is required that the immersion flow field still meet the requirements of the working conditions. This requires a precise posture adjustment device to adjust the posture of the immersion unit to meet the requirements of the immersion lithography machine. [0...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B25J9/02
Inventor 傅新邵杰杰陶岳帮廖安志陈文昱马同
Owner ZHEJIANG UNIV
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