Display substrate, manufacturing method thereof and display device

A display substrate and mixed light technology, applied in nonlinear optics, instruments, optics, etc., can solve the problems of high elastic recovery rate, refined size and height, and cannot be obtained at the same time, and achieve high elastic recovery rate and refined size and height effect

Inactive Publication Date: 2014-10-01
BOE TECH GRP CO LTD +1
View PDF4 Cites 5 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0012] The present invention provides a display substrate, a manufacturing method thereof, and a display device, which are used to solve the problem that the spacers formed on the display substrate are limited by materials and cannot simultaneously obtain a higher elastic recovery rate and a more refined size and height.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Display substrate, manufacturing method thereof and display device
  • Display substrate, manufacturing method thereof and display device
  • Display substrate, manufacturing method thereof and display device

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0037] In a liquid crystal display device, the cell thickness uniformity of the display panel is one of the important factors affecting the display quality. Therefore, the spacer required to support the thickness of the display panel box must have a high enough elastic recovery rate and a sufficiently refined size and height.

[0038] Existing spacers are usually columnar spacers made of negative photoresist materials (the part irradiated by light will not be removed by the developer, while the part not irradiated by light can be removed by the developer), for example: The negative photoresist material may be composed of acrylate or epoxy resin copolymer, and corresponding crosslinking agent and photoinitiator are added to the acrylate or epoxy resin copolymer. Among them, acrylate and epoxy resin are photopolymerizable monomers, which will undergo polymerization reaction to form polymer after being irradiated by light. The role of the photoinitiator is to catalyze the polyme...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention relates to the technical field of liquid crystal display and discloses a display substrate, a manufacturing method thereof and a display device. An insulating pad is formed on the display substrate and made from a mixed photoresist material, the mixed photoresist material includes a photoresist material and a light absorber added in the photoresist material and absorbing specific wave-length light, and the light absorber is distributed in the mixed photoresist material in an uneven mode. The insulating pad made from the mixed photoresist material simultaneously has high elasticity recovery rate, fine size and height.

Description

technical field [0001] The invention relates to the technical field of liquid crystal display, in particular to a display substrate, a manufacturing method thereof, and a display device. Background technique [0002] The main structure of the liquid crystal display is a liquid crystal panel. The liquid crystal panel includes a color filter substrate and an array substrate. Columnar spacers are formed on the color filter substrate or the array substrate to support the cell thickness of the panel. In order to obtain better display uniformity, it is necessary to ensure that the columnar spacer has a high elastic recovery rate. [0003] In the prior art, the columnar spacer is usually a negative photoresist material, which is composed of acrylate or epoxy resin copolymer, and the copolymer contains acrylate or epoxy resin crosslinking agent, photoinitiator and other substances. Among them, acrylate or epoxy resin is a photopolymerizable monomer, which will undergo polymerizatio...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): G02F1/1339G02F1/1333
Inventor 崔晓鹏
Owner BOE TECH GRP CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products