Organic light-emitting diode and preparation method thereof
An electroluminescence device and electroluminescence technology, which are applied in the directions of organic semiconductor devices, materials of organic semiconductor devices, and electric solid state devices, etc., can solve the problems of short lifespan, material aging and failure of light-emitting devices, and can block the corrosion of water and oxygen. , long life, improve the effect of water and oxygen resistance
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[0047] Please also see figure 2 , the preparation method of the organic electroluminescent device 100 of one embodiment, it comprises the following steps:
[0048] Step S110 , forming a functional layer 20 on the anode 10 .
[0049] The functional layer 20 includes a hole injection layer, a hole transport layer, a light emitting layer, an electron transport layer, and an electron injection layer stacked in sequence.
[0050] The anode 10 may be a conductive glass substrate or a conductive organic polyethylene terephthalate (PET) film substrate. The anode 10 has an ITO layer prepared with an anode pattern. The thickness of the ITO layer is 100nm˜150nm.
[0051] Before forming the functional layer 20, the surface of the anode 10 is pretreated to remove pollutants on the surface of the substrate 10, and the surface is activated to increase the oxygen content on the surface of the anode 10 to improve the work function of the surface of the anode 10. Specifically, the anode 10...
Embodiment 1
[0082] The structure prepared in this example is: ITO / NPB: MoO 3 / TCTA / TPBI:Ir(ppy) 3 / Bphen / Bphen:CsN 3 / Al / The organic electroluminescent device with the cap; wherein, the oblique bar " / " indicates a layered structure, and the colon ":" indicates doping, the same below.
[0083] The preparation method of the above-mentioned organic electroluminescent device comprises the following steps:
[0084] 1. Form a functional layer on the anode.
[0085] Anode 10 is conductive glass. The anode 10 has an ITO layer prepared with an anode pattern. The thickness of the ITO layer is 150 nm.
[0086] Before forming the functional layer 20, the surface of the anode 10 is pretreated to remove pollutants on the surface of the substrate 10, and the surface is activated to increase the oxygen content on the surface of the anode 10 to improve the work function of the surface of the anode 10. Specifically, the anode 10 is ultrasonically cleaned for 5 minutes with acetone-free, ethanol, ion...
Embodiment 2
[0103] The structure prepared in this example is: ITO / NPB: MoO 3 / TCTA / TPBI:Ir(pp y ) 3 / Bphen / Bphen:CsN 3 / Al / organic electroluminescent devices with capsulation.
[0104] The preparation method of the above-mentioned organic electroluminescent device comprises the following steps:
[0105] 1. Form a functional layer on the anode.
[0106] Anode 10 is conductive glass. The anode 10 has an ITO layer prepared with an anode pattern. The thickness of the ITO layer is 120 nm.
[0107] Before forming the functional layer 20, the surface of the anode 10 is pretreated to remove pollutants on the surface of the substrate 10, and the surface is activated to increase the oxygen content on the surface of the anode 10 to improve the work function of the surface of the anode 10. Specifically, the anode 10 is ultrasonically cleaned for 5 minutes with acetone-free, ethanol, ionized water, and ethanol in sequence, and then blown dry with nitrogen and oven-dried.
[0108] The material...
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Abstract
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