Method and system for controlling automatic dispatch of photo-masks

Abstract

The invention discloses a method for controlling automatic dispatch of photo-masks. The method for controlling automatic dispatch of photo-masks comprises the following steps: obtaining operable machine tables of each photo-mask, the number of the operable machine tables and the number of products using the photo-mask, as well as operable photo-masks of each photo-etching machine table and the number of the operable photo-masks; distributing the photo-mask with the minimum number of the operable machine tables to the photo-etching machine table which has the minimum number of the photo-masks and can operate the photo-masks in undistributed photo-masks; modifying the operable photo-masks of the photo-etching machine table and the number of the operable photo-masks according to a distribution result of the last step; repeating the steps until all the photo-masks are distributed; and generating an automatic dispatch control table according to distribution results of all the photo-masks. The method for controlling the automatic dispatch of the photo-masks is capable of enabling each photo-etching machine table of a production line to be maximally used and simultaneously avoiding unbalance load and misplacement of the photo-masks between the photo-etching machines.

Description

technical field [0001] The invention relates to semiconductor production and manufacturing management, in particular to a control method and control system for automatic dispatching of photomasks. Background technique [0002] In the semiconductor manufacturing process, the operation mode of the lithography machine is different from other general machines. This is because for a general machine, the operator only needs to send the product to be processed to the machine to complete the operation; while the operation of the photolithography machine requires the operator to first send the corresponding light of the product to be processed. Put the cover into the machine, and then dispatch the products. However, since the operator can only carry the information of the work product on the current machine, the following problems will be encountered in the project of putting the photomask into the machine: [0003] 1. The operator puts a photomask into a machine that cannot proces...

AI Technical Summary

Problems solved by technology

[0003] 1. The operator puts a photomask into a machine that cannot process the photomask, resulting in loss of machine productivity and long-term stagnation of products;

[0004] 2. The operator puts multiple photomasks into the same machine, causing the remaining lithography machines to be idle, failing to balance the load between the machines, and wasting the production capacity of the lithography machines;

[0005] 3. The operator does not consider the products that are about to reach the photolithography process step, resulting in the failure to place the corresponding photomask in the machine in time, causing the products to stagnate

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