A multi-channel liquid temperature adjustment device and temperature control method

Abstract

A multi-channel liquid temperature adjustment device and its temperature control method, which belong to the liquid temperature adjustment device and its temperature control method, solve the problem that the existing photolithography machine immersion liquid temperature adjustment control device only has the temperature control capability of one output and cannot coordinately adjust the remote The problem of water supply temperature at the end and near end. The temperature regulating device of the present invention includes a pure water supply part, a liquid injection part and a control system, the pure water supply part is placed in the remote pure water equipment, and the liquid injection part is placed inside the photolithography machine; the pure water supply part and the injection The liquid parts are connected through remote pipelines; the control system collects the temperature values ​​of the pure water temperature sensor, the water supply temperature sensor, and the first to third temperature sensors respectively; and controls the heating voltage of the first to third heaters, At the same time, the driving current of the cooling water flow servo valve is controlled. The invention utilizes the cooperation of the heat exchanger and the low-power heater, adjusts the flow through the flow servo valve and adjusts the power of multiple low-power heaters, so that the pure water temperature at multiple output ends reaches a stable value of ±0.01°C.

Description

technical field [0001] The invention belongs to a liquid temperature regulating device and a temperature control method thereof, in particular to a multi-channel liquid temperature regulating device and a temperature control method thereof, which uses a heat exchanger and a low-power heater to adjust the flow through a flow servo valve and adjust multiple The power of a low-power heater makes the temperature of pure water at multiple output ends reach a steady-state accuracy of ±0.01°C. Background technique [0002] The space between the last projection objective lens and the silicon wafer of the immersion lithography machine is filled with immersion liquid. According to the Rayleigh criterion, the resolution of the lithography machine Among them, NA is the numerical aperture of the projection objective lens, λ is the wavelength of the light source, k 1 is a constant factor, the temperature change of the immersion liquid will directly cause the change of the liquid refract...

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Problems solved by technology

[0006] The present invention provides a multi-channel liquid temperature adjustment device, and provides its temperature control method at the same time, solving the problem that the existing photolithography machine immersion liquid temperature adjustment control device only has the temperature control capability of one output, and cannot meet the multi-channel liquid injection requirements of the immersion unit problems, and the problem that the remote and near-end water supply temperature adjustments cannot be coordinated

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