Method and device for monitoring laser spectrum and spectral energy distribution simultaneously

Abstract

The invention discloses a method and device for monitoring laser spectrum and spectral energy distribution simultaneously. The method includes the steps that a light blocking system is used for enabling laser light with a specific spectral range in laser light to be monitored to be incident to a light splitting system, the light splitting system is used for splitting the laser light into two beams, one laser light beam is used for detecting and displaying the spectrum, the other laser light beam is used for conducting energy detection, the light blocking system is adjusted so as to change the spectral range of the laser light which passes through the light blocking system, and the spectral energy distribution of the laser light to be monitored is acquired according to the displayed spectral range and the energy corresponding to the displayed spectral range. The light blocking system can be formed by adjustable slits with the sizes and the positions of openings capable of being adjusted. According to the method and device for monitoring the laser spectrum and the spectral energy distribution simultaneously, the laser spectrum and the corresponding energy distribution of the incident laser light can be observed simultaneously, simpleness and rapidness are achieved, operation is convenient, and reliability is high.

Description

technical field [0001] The invention relates to the field of laser technology, in particular to a method and device for simultaneously monitoring laser spectrum and spectrum energy distribution. Background technique [0002] Excimer laser is widely used in VLSI lithography due to its short wavelength and other characteristics. Narrow radiation spectral width is one of the most important technical indicators of excimer lasers used in lithography, which directly affects the size of chromatic aberration in the objective mirror aberration of the exposure system and the exposure latitude. There are two key indicators for examining the spectral width of lithography light sources: FWHM (Full Width Half Maximum) and E95 bandwidth. Among them, E95 is an important index to measure the spectral purity, emphasizing the spectral energy distribution of pulsed lasers, its size and stability are crucial for lithography applications, and affect the imaging capability of the exposure system ...

AI Technical Summary

Problems solved by technology

[0007] The invention aims to solve the problem of simultaneous detection and demodulation of narrow spectrum and wide spectrum information to detect laser spectral energy distribution information more accurately and conveniently

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