Semiconductor device and method for producing same
A manufacturing method and semiconductor technology, which are applied in the direction of semiconductor devices, semiconductor/solid-state device components, electric solid-state devices, etc., to achieve the effects of high heat dissipation, large occupation area, and small thermal resistance
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[0061] Hereinafter, the semiconductor device and its manufacturing method of the present invention will be described in detail. In addition, various elements shown in the drawings are merely schematically shown for understanding the present invention, and it should be noted that dimensional ratios, appearances, etc. may be different from actual ones.
[0062] [Semiconductor device of the present invention]
[0063] exist figure 2 (A) to (C) schematically show the configuration of the semiconductor device of the present invention. As shown in the figure, the semiconductor device 100 of the present invention includes a metal buffer layer 10 , a metal buffer layer substrate 30 and a semiconductor element 50 . The semiconductor element 50 has a form provided on the metal buffer layer 10 and is provided in contact with at least a part of the base 30 on the metal buffer layer. The metal buffer layer 10 is used as an external connection terminal (such as an electrode member of a ...
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