A gas-suspended lower electrode and dry etching device

Abstract

The invention relates to the technical field of displaying, in particular to an air-bearing lower electrode and a dry etching device. The air-bearing lower electrode comprises an lower electrode body, a lower electrode controller and at least one pair of pressure sensors; the pressure sensors are disposed at positions, close to the edge, of the lower electrode body; every two pressure sensors in a pair are provided in order from inside to outside; according to pressure values measured by the pressure sensors, the lower electrode controller controls gas flow in a cooling gas through hole. Thus, a glass substrate and the air-bearing lower electrode are kept suspended during etching, and zero etching defect is achieved; the glass substrate is evenly heated, and etching uniformity and etching quality are improved indirectly; the problem that adhesive power of the glass substrate and the lower electrode body increases due to wear of the lower electrode body is also avoided, and glass damage is never caused.

Description

technical field [0001] The invention relates to the field of display technology, in particular to an air suspension type lower electrode and a dry etching device. Background technique [0002] At present, the TFT-LCD (non-radiative thin film transistor active matrix liquid crystal display) in the liquid crystal display is composed of a color film substrate on which red, green and blue primary color filters are deposited and an array substrate integrating thin film transistor TFT. The formation of the substrate and the array substrate, especially the formation of the array substrate, goes through a very complicated process flow. [0003] Existing dry etching equipment is usually divided into an upper electrode and a lower electrode, one as an anode and the other as a cathode. Dry etching is performed by using a vacuum process gas and a plasma reaction generated by applying a voltage to generate atoms and atomic groups that react with substances deposited on a substrate to ge...

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Problems solved by technology

[0008] The object of the present invention is to provide an air-suspended lower electrode and a dry etching device to solve the problem that the cylindrical protrusion on the lower electrode in the existing dry etching method is easy to cause damage to the back of the substrate and the glass substrate is not heated. average problem

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