Processing method of vacuum diode
A technology of vacuum diode and processing method, which is applied in the direction of electrode assembly manufacturing, etc., can solve the problems of complex process, difficult to meet the batch production of vacuum diodes, long processing cycle, etc., and achieve the effect of uniform electric field distribution
Active Publication Date: 2017-02-01
HUADONG PHOTOELECTRIC TECHN INST OF ANHUI PROVINCE
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Problems solved by technology
The processing method of vacuum diodes has the defects of long processing cycle, complex process and high production cost, and it is difficult to meet the needs of batch production of vacuum diodes
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[0033] Specific embodiments of the present invention will be described in detail below in conjunction with the accompanying drawings. It should be understood that the specific embodiments described here are only used to illustrate and explain the present invention, and are not intended to limit the present invention.
[0034] In the present invention, in the absence of a contrary statement, the orientation words included in the term, such as "upper, lower, top, bottom", etc., only represent the orientation of the term in the normal use state, or are understood by those skilled in the art colloquial term and should not be construed as a limitation of the term.
[0035] The invention provides a processing method of a vacuum diode, the processing method comprising:
[0036] a, one end of two first nickel sheets 2 is welded on the anode 1 (see figure 1 ) and bend the first nickel sheet 2 (see figure 2 ) forming an anode support assembly;
[0037] B, one end of a plurality of ...
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The invention discloses a processing method of a vacuum diode, comprising: a. welding one ends of two first nickel sheets to the anode and bending the first nickel sheets to form an anode support assembly; b. connecting one end of the second nickel sheet to the anode The metal lead of the first stem of the filament is welded, and the other end is welded to the metal lead of the top of the second stem to form an insulating support; c, the two first tantalum sheets are dislocated and welded to the bottom of the cathode, and the first tantalum sheets are respectively connected to the bottom of the cathode The third nickel sheet is welded into a cathode support assembly; d, the third nickel sheet is welded on the metal lead on the top of the first stem and the cathode is welded to the metal lead of the first stem by the bottom of the second tantalum sheet , the other end of the first nickel sheet is welded to other metal leads on the top of the first stem to form a diode basic structure; e, the diode basic structure is placed in a glass tube to form a vacuum diode; the upper surface of the cathode and the lower surface of the anode The surfaces are parallel. The vacuum diode has excellent stability and high emission current density.
Description
technical field [0001] The invention relates to a vacuum diode, in particular to a processing method for a vacuum diode. Background technique [0002] The cathode assembly is one of the key components of the traveling wave tube. The higher the emission current density of the cathode assembly is, the better the performance of the traveling wave tube will be. With the increasing requirements of high-power traveling wave tubes, the current cathode emission current density is insufficient to meet the production needs. In order to detect whether the emission current density of the traveling wave tube meets the requirements, it is necessary to install the cathode assembly in the glass tube to form a vacuum diode. [0003] The processing method of the existing vacuum diode is as follows: respectively fix the cathode and the anode on the insulating base of the brazing assembly, then fix the insulating base of the brazing assembly on the stem, and also weld the filament on the stem,...
Claims
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IPC IPC(8): H01J9/18
CPCH01J9/18
Inventor 孟昭红陈爱民于晨晨卞磊王莹
Owner HUADONG PHOTOELECTRIC TECHN INST OF ANHUI PROVINCE