Optical system and exposure machine
An optical system and optical mirror technology, applied in the field of exposure machines, can solve the problems of parallelism of ultraviolet exposure lamps and poor energy uniformity, and achieve the effect of improving work efficiency
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[0022] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be further described in detail below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described here are only used to explain the present invention, not to limit the present invention.
[0023] Please also refer to figure 1 The optical system 10 provided in the specific embodiment of the present invention is used for pattern transfer, and the optical system 10 includes a UV-LED surface light source assembly 11 for emitting ultraviolet light to provide a surface light source, and a UV-LED surface light source assembly 11 for reflecting UV-LED surface light source. The cold mirror 12 that emits the ultraviolet light, receives and transmits the compound eye homogenization component 13 of the ultraviolet light reflected by the cold mirror 12, receives the ultraviolet light transmitted ...
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