Method for cutting silicon wafer through low-particle electroplating gold wire
A diamond wire cutting and silicon wafer technology, which is used in fine working devices, stone processing equipment, manufacturing tools, etc., can solve the problems of uneven thickness of silicon wafers and high damage rate of silicon wafer surface, and achieve a good cutting environment and particle count. Increase, the effect of increased wear strength
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Embodiment 1
[0016] Embodiment 1: a kind of method of applying low-particle electroplating diamond wire to cut silicon chips, it comprises the following steps: (1) sticking stick; (2) wire cutting; (3) degumming; (4) inserting sheet; (5) cleaning : (6) Inspection;
[0017] (1) Gluing rods: Glue the qualified silicon rods according to the process requirements.
[0018] (2) Wire cutting: the silicon rods that have been glued are loaded onto the electroplated diamond wire cutting machine, and cut with electroplated diamond wires, and the silicon rods are processed into silicon wafers; wherein the particle height of the electroplated diamond wires is The main problem of 6um, low-particle electroplated diamond wire compared with medium-high particle electroplated diamond wire is insufficient cutting ability. Therefore, the cutting ability of the low-particle electroplated diamond wire is improved through three aspects of parameter control. The first On the one hand, increase the line speed. At...
Embodiment 2
[0025] A method for cutting silicon chips using low-particle electroplating diamond wires, comprising the following steps: (1) sticking sticks; (2) wire cutting; (3) degumming; (4) inserting sheets; (5) cleaning: (6) test;
[0026] (1) Gluing rods: Glue the qualified silicon rods according to the process requirements.
[0027] (2) Wire cutting: the silicon rods that have been glued are loaded onto the electroplated diamond wire cutting machine, and are cut with electroplated diamond wires, and the silicon rods are processed into silicon wafers; wherein the particle height of the electroplated diamond wires is The main problem of 12um, low-particle electroplated diamond wire compared with medium-high particle electroplated diamond wire is insufficient cutting ability. Therefore, the cutting ability of the low-particle electroplated diamond wire is improved through three aspects of parameter control. The first On the one hand, increase the line speed. At present, the line speed...
Embodiment 3
[0034] A method for cutting silicon wafers using low-particle electroplating diamond wires, comprising the following steps: (1) sticking sticks; (2) wire cutting; (3) degumming; (4) inserting sheets; (5) cleaning: (6) test;
[0035] (1) Gluing rods: Glue the qualified silicon rods according to the process requirements.
[0036] (2) Wire cutting: the silicon rods that have been glued are loaded onto the electroplated diamond wire cutting machine, and cut with electroplated diamond wires, and the silicon rods are processed into silicon wafers; wherein the particle height of the electroplated diamond wires is The main problem of 9um, low-particle electroplated diamond wire compared with medium-high particle electroplated diamond wire is insufficient cutting ability. Therefore, the cutting ability of the low-particle electroplated diamond wire is improved through three aspects of parameter control. The first On the one hand, increase the line speed. At present, the line speed of ...
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