Electrical servo alignment control system and control method for lithography machine

Abstract

The invention discloses an electrical servo position alignment control system and an electrical servo position alignment control method of a photoetching machine. The control system comprises a pneumatic triple element connected with an air source, an electrical servo direction flow valve, an electrical proportion flow regulator, an air-hydraulic damping cylinder formed by a servo cylinder and a hydraulic cylinder through series connection, a static-pressure air-floatation guide rail of a support workbench, a CCD (Charge Coupled Device) image sensor located above the workbench, and a photoetching machine controller, wherein the pneumatic triple element is connected with the electrical servo direction flow valve and the static-pressure air-floatation guide rail by two pipelines respectively, the electrical servo direction flow valve is connected with the servo cylinder, the electrical proportion flow regulator is connected with the hydraulic cylinder, a push rod of the hydraulic cylinder is connected to the workbench, and the photoetching machine controller is connected with the electrical servo direction flow valve, the electrical proportion flow regulator and the CCD image sensor. According to the electrical servo position alignment control system and the electrical servo position alignment control method of the photoetching machine, the homeostatic control precision of the system can be improved, and the position of the workbench can be accurately controlled.

Description

technical field [0001] The invention belongs to the field of optical electromechanical equipment, and in particular relates to an electrical servo alignment control system and a control method for a photolithography machine. Background technique [0002] Parallel photolithography machine is a device that uses parallel light exposure method to realize printed circuit board (PCB) imaging. Its exposure accuracy (alignment accuracy between workbench and film) determines the line width and line spacing accuracy of PCB products, and thus determines the accuracy of electronic products. circuit integration and size. [0003] The lithography machine is mainly composed of a precision workbench system, an optical system, an environmental control system, a rack system, and a conveying system. The main factors affecting the alignment accuracy of the parallel photolithography machine are the interference of the driving mechanism of the precision workbench, the ambient temperature and the...

AI Technical Summary

Problems solved by technology

[0004] The first object of the present invention is to provide an electrical servo alignment control system for a lithography machine, which can solve the problems of thermal deformation and friction of the workbench of the lithography machine, improve the steady-state control accuracy of the system, and realize precise control of the position of the workbench

Images