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Preparation method of high-refractive-index high-transparency friction type silicon dioxide

A silicon dioxide and refractive index technology, applied in the direction of silicon dioxide, silicon oxide, etc., can solve the problems of reduced transparency, no effective solution, no specific disclosure of refractive index, transparency, etc., to improve transparency and reduce interface freedom Good performance and dispersibility

Active Publication Date: 2015-04-22
GUANGZHOU FEIXUE MATERIAL TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

At present, the production process of friction silica for toothpaste pays more attention to the improvement of transparency, but there is still no effective solution for the parabolic change of transparency in a certain range of refractive index.
The transparency of silicon dioxide will decrease with the increase of its friction value. How to ensure high transparency without affecting the friction performance is an urgent problem to be solved in the toothpaste industry
The purpose of this invention is to improve the friction coefficient and particle strength of the product, and the refractive index and transparency are not specifically disclosed, so this invention does not bring technical inspiration to the present invention

Method used

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  • Preparation method of high-refractive-index high-transparency friction type silicon dioxide

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0029] A method for preparing high-refractive-index high-transparency friction-type silica, comprising the following steps:

[0030] (1) The deployment concentration is 2.0M sodium silicate solution 10m 3 , add 1.0kg surfactant, stir evenly, described surfactant is the mixture that sodium lauryl sulfate and sodium laureth sulfate mix with weight ratio 1:1;

[0031] (2) Inject 10m of 2.5% sodium sulfate solution into the reaction tank 3 , turn on the stirring device and heat to 80°C;

[0032] (3) Add sodium silicate solution to the reaction tank at a flow rate of 12m3 / h, add sulfuric acid solution at the same time after 0.5min, control the pH value at 9.0, continue to add sulfuric acid solution after adding the sodium silicate solution to control the pH value at the end of the reaction When the temperature is 4.4, stop adding the sulfuric acid solution, keep the temperature at 80°C, and continue to stir and sink for 10 minutes to obtain a slurry;

[0033] (4) Press filter th...

Embodiment 2

[0035] A method for preparing high-refractive-index high-transparency friction-type silica, comprising the following steps:

[0036] (1) The deployment concentration is 2.5M sodium silicate solution 13m 3 , add 2.0kg of surfactant and stir evenly, the surfactant is a mixture obtained by mixing sodium lauryl sulfate and polyethylene glycol (600) dilaurate at a weight ratio of 1:1;

[0037] (2) Inject 10m of 4.5% sodium sulfate solution into the reaction tank 3 , turn on the stirring device and heat to 90°C;

[0038] (3) Add sodium silicate solution to the reaction tank at a flow rate of 16m3 / h, add sulfuric acid solution at the same time after 1min, control the pH value at 9.5, continue to add sulfuric acid solution after adding the sodium silicate solution to control the pH value at the end of the reaction 4.8, stop adding sulfuric acid solution, keep the temperature at 85°C, continue stirring and sinking for 15 minutes to obtain slurry;

[0039] (4) Press filter the slurry...

Embodiment 3

[0041] A method for preparing high-refractive-index high-transparency friction-type silica, comprising the following steps:

[0042] (1) The deployment concentration is 2.3M sodium silicate solution 11m 3 , add 1.5kg surfactant, stir, and described surfactant is the mixture that cocamidopropyl amine oxide and sodium lauryl sulfate mix with weight ratio 1:1.5;

[0043] (2) Inject 10m of 3.5% sodium sulfate solution into the reaction tank 3 , turn on the stirring device and heat to 85°C;

[0044] (3) Add sodium silicate solution to the reaction tank at a flow rate of 14m3 / h, add sulfuric acid solution at the same time after 0.5min, control the pH value at 9.3, continue to add sulfuric acid solution after adding the sodium silicate solution to control the pH value at the end of the reaction When the temperature is 4.5, stop adding the sulfuric acid solution, keep the temperature at 85°C, and continue to stir and sink for 10 minutes to obtain a slurry;

[0045] (4) Press filter...

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Abstract

The invention provides a preparation method of high-refractive-index high-transparency friction type silicon dioxide. The preparation method comprises the following steps: (1) blending a sodium silicate solution, adding a surfactant, and stirring uniformly; (2) injecting sodium sulfate solution into a reaction tank, starting a stirring device, and heating to 80-90 DEG C; (3) adding the sodium silicate solution into the reaction tank, synchronously adding sulfuric acid solution after 0.5-1 minute, controlling a pH value to be 9.0-9.5, further adding the sulfuric acid solution after the sodium silicate solution is completely added, controlling the pH value of a reaction end point to be 4.4-4.8, then stopping adding the sulfuric acid solution, keeping temperature at 80-85 DEG C, and further stirring and precipitating for 10-15 minutes to obtain slurry; and (4) performing pressure filtration on the slurry obtained in the step (3) to obtain a filter cake, washing the filter cake by using deionized water, and drying and crushing the washed filter cake to obtain high-refractive-index high-transparency friction type silicon dioxide. Silicon dioxide prepared by using the method provided by the invention is high in refractive index and wide in range, ensures that the transparency can reach 99.0%, and also has good cleaning performance and fluorine compatibility.

Description

technical field [0001] The invention belongs to silicon dioxide for toothpaste production, in particular to a preparation method of high-refractive-index and high-transparency frictional silicon dioxide. Background technique [0002] Silica is widely used in the toothpaste industry because of its stable physical and chemical properties, strong cleaning ability, good compatibility with toothpaste systems, and can be used in the preparation of transparent toothpaste. Silica is used as an abrasive and as a thickener in toothpaste. [0003] The higher the light transmittance of silica, the better the transparency of the toothpaste paste. Transparent toothpaste is deeply loved by consumers because of its unique appearance, which brings refreshing, clean and safe feeling to consumers. However, not all silica can be used in the preparation of transparent toothpaste. It is necessary to ensure that the silica The refractive index is consistent with the refractive index of the toot...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C01B33/12
Inventor 庹文喜林英光王宪伟梁桢威
Owner GUANGZHOU FEIXUE MATERIAL TECH
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