Gas Processing Apparatus

A gas treatment and gas technology, applied in the field of gas treatment devices, can solve the problems of maintenance time, cost increase, product cost competitiveness decline, product cost increase, etc., to improve the efficiency of detoxification, easy management, prevent The effect of corrosion

Inactive Publication Date: 2015-05-27
KANKEN TECHNO
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0006] When the gas treatment equipment is prepared one by one corresponding to various processing target gases discharged from the industrial process in this way, the management of the equipment becomes complicated for some users, and at the same time, the time and cost required for maintenance increase.
As a result, the product cost increases, leading to a decrease in product cost competitiveness

Method used

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Embodiment Construction

[0075] Next, the present invention will be described based on the illustrated embodiments. figure 1 It is a structural diagram showing the outline of the gas processing apparatus 10 of this embodiment. As shown in the figure, the gas treatment device 10 of this embodiment is roughly composed of a reactor 12, a plasma generator 14, a water supply device 16, a front wet scrubber 18, a water tank 20, a rear wet scrubber 22, and the like.

[0076] The reactor 12 is a device for thermally decomposing the gas F to be treated inside the atmospheric pressure plasma P generated by the plasma generator 14 described later and the gas F to be treated. Tube 12a and cylindrical inner tube 12b constitute a double-layer tube; the outer tube 12a is closed at both ends, and is erected on the water tank 20; Both ends are open, and at the same time, one axial end (upper end) is arranged to form a gap with the upper end surface of the outer cylinder 12a, and the other axial end (lower end) penetr...

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Abstract

A gas processing apparatus of high versatility that ensures easy management and low maintenance frequency, and that is capable of processing a wide variety of processing object gases emitted from industrial processes, such as semiconductor manufacturing process. There is provided gas processing apparatus (10) equipped with reactor (12) surrounding atmospheric pressure plasma (P) and processing object gas (F) fed toward atmospheric pressure plasma (P), adapted to perform pyrolysis of the processing object gas (F) thereinside, characterized in that the reactor (12) is fitted with water supply means (16) for covering the internal surface thereof with water (W). By this construction, so-known "wet wall" is provided on approximately the whole of the internal surface of the reactor (12). Thus, there can be attained not only prevention of sticking / accumulation resulting from contact of solid components of the processing object gas (F) with the internal surface of the reactor (12) but also retardation of deterioration of the internal surface.

Description

[0001] This application is a divisional application of an invention patent application named "gas processing device", the international application date is August 3, 2007, the international application number is PCT / JP2007 / 065279, and the national application number is 200780043055.9. technical field [0002] The present invention relates to an apparatus for decomposing and treating gases including gases harmful to the human body, gases that warm the earth, and gases that destroy the ozone layer, especially gases discharged from the manufacturing processes of semiconductors and liquid crystals. Background technique [0003] At present, various industrial processes are developed and implemented as industrial processes for manufacturing or processing substances, and there are many kinds of gases (hereinafter referred to as "processing target gases") discharged from such various industrial processes. [0004] For this purpose, various gas treatment methods and gas treatment devi...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B01D53/14B01D53/32
CPCB01D53/14B01D53/32B01D2257/20B01D2258/0216B01D2259/818B01D53/46B01J19/08
Inventor 加藤利明今村启志
Owner KANKEN TECHNO
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