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Oxide cathode plasma source with large area and high ionization rate

A technology of oxide cathode and plasma source, applied in circuits, discharge tubes, electrical components, etc., can solve the problem of no oxide cathode with large size, and achieve the effect of stable structure, guaranteed stability and good electrical connection

Inactive Publication Date: 2015-06-03
UNIV OF SCI & TECH OF CHINA
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

In some application fields, experimenters need a large-scale uniform background plasma environment, but there is no large-scale oxide cathode in the prior art

Method used

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  • Oxide cathode plasma source with large area and high ionization rate
  • Oxide cathode plasma source with large area and high ionization rate
  • Oxide cathode plasma source with large area and high ionization rate

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Embodiment Construction

[0019] In order to make the present invention easy to understand, the present invention will be further described below in conjunction with specific illustrations.

[0020] Such as Figure 2-5 As described above, a large-area high ionization rate oxide cathode plasma source, its main components include an upper beam 11, a lower beam 12, a cathode plate 13, a fixed plate 14, a filament (or ceramic tube) array 15, and a limit rod 16 , Electrical connecting sheet 17, ceramic tube limiting groove 18, reflecting plate 19 and other components.

[0021] Due to the large temperature difference between the working temperature and the assembling temperature, and the size of the oxide cathode is relatively large, the supporting frame of the present invention adopts a segmented type, and the main weight is borne by the upper beam 11 and the lower beam 12 . Such as figure 2 , respectively have 3 holes up and down on the fixed plate, wherein the hole 146 in the center of the bottom is a ...

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Abstract

The invention discloses an oxide cathode plasma source with a large area and a high ionization rate. The oxide cathode plasma source comprises a supporting frame formed by an upper beam, a lower beam and a fixed plate, a lamp filament array used for heating, and a metal reflector plate arranged at the back and the periphery of the lamp filament array, and a cathode plate, wherein the fixed plate is of an annular structure with the polygonal exterior and the round interior, and wafers are arranged on the outer edge of the cathode plate; the cathode plate is electrically connected to the fixed plate through electric connection pieces, and the electric connection pieces are easily-deformable metal sheets. The oxide cathode plasma source has the advantages of stable structural performance and capability of producing large-scale uniform plasma environment.

Description

technical field [0001] The invention relates to the technical field of hot cathodes, in particular to a large-area high ionization rate oxide cathode plasma source. Background technique [0002] Oxide cathodes are widely used in the electronics industry and are a further development of hot filament cathodes. The so-called oxide cathode generally refers to a general term for a class of emitters made by spraying a layer of alkaline earth metal oxide on the surface of the base metal. ", "Oxide Cathode Volume II", Jiang Jianping's "Cathode Electronics and Gas Discharge Principles" has a detailed introduction to oxide cathodes. Compared with hot filament cathodes, its work function and operating temperature are much lower, but its emission efficiency is much higher than that of thoriated tungsten cathodes. What's even more commendable is that in pulse discharge mode, it can provide much larger current density than hot filament cathode. A typical example of the application of o...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01J37/08
Inventor 谢锦林胡广海金晓丽袁林张乔枫杨尚川
Owner UNIV OF SCI & TECH OF CHINA