Oxide cathode plasma source with large area and high ionization rate
A technology of oxide cathode and plasma source, applied in circuits, discharge tubes, electrical components, etc., can solve the problem of no oxide cathode with large size, and achieve the effect of stable structure, guaranteed stability and good electrical connection
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[0019] In order to make the present invention easy to understand, the present invention will be further described below in conjunction with specific illustrations.
[0020] Such as Figure 2-5 As described above, a large-area high ionization rate oxide cathode plasma source, its main components include an upper beam 11, a lower beam 12, a cathode plate 13, a fixed plate 14, a filament (or ceramic tube) array 15, and a limit rod 16 , Electrical connecting sheet 17, ceramic tube limiting groove 18, reflecting plate 19 and other components.
[0021] Due to the large temperature difference between the working temperature and the assembling temperature, and the size of the oxide cathode is relatively large, the supporting frame of the present invention adopts a segmented type, and the main weight is borne by the upper beam 11 and the lower beam 12 . Such as figure 2 , respectively have 3 holes up and down on the fixed plate, wherein the hole 146 in the center of the bottom is a ...
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