Anti-reflection film, its preparation method and anti-reflection glass
A technology of anti-reflection film and refractive index adjustment layer, which is applied in the field of anti-reflection film and anti-reflection glass, and can solve problems such as easy scratches, affecting product appearance, and poor insulation performance
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[0044] The preparation method of the above-mentioned anti-reflection film 100 includes the following steps:
[0045] S10, providing a substrate.
[0046] It should be noted that the substrate may be a glass substrate, a silicon wafer, or a PET film, depending on the situation in which the anti-reflection film 100 is used.
[0047] Preferably, the substrate is first cleaned and dried.
[0048]S20 , sequentially depositing the first refractive index adjustment layer 20 , the second refractive index adjustment layer 30 , the third refractive index adjustment layer 40 , the fourth refractive index adjustment layer 50 and the fifth refractive index adjustment layer 60 on the surface of the substrate.
[0049] The material of the first refractive index adjustment layer 20 is silicon nitride (Si 3 N 4 ). Si 3 N 4 The refractive index of 1.7 ~ 1.8. Using Si 3 N 4 As the material of the first refractive index adjustment layer 20 , the transmittance of the first refractive inde...
Embodiment 1
[0088] The structure of the anti-reflection film of embodiment 1 is Si 3 N 4 (11nm) / SiO 2 (10nm) / SiN(5nm) / SiO 2 (105nm) / SiN(5nm). Wherein, " / " represents a stacked structure, and the values in brackets represent thicknesses, which are the same in the following embodiments.
[0089] The anti-reflection film of Example 1 was subjected to a hardness test using a Mitsubishi pencil, and the result was 8H.
[0090]The anti-reflection film of Example 1 was tested for light with a wavelength range of 380-780 nm by using a spectroscopic testing instrument, and the single-sided reflectance at 550 nm was 1.4%.
Embodiment 2
[0092] The structure of the anti-reflection film of embodiment 2 is Si 3 N 4 (10nm) / SiO 2 (5nm) / SiN(10nm) / SiO 2 (102nm) / SiN(8nm).
[0093] The anti-reflection film of Example 2 was subjected to a hardness test using a Mitsubishi pencil, and the result was 8H.
[0094] The anti-reflection film of Example 2 is tested for light with a wavelength range of 380-780 nm by using a spectroscopic testing instrument, and the single-sided reflectance at 550 nm is 1.2%.
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