Process and device of forming multilayer insulating thin film on inner wall of glass container

Abstract

The invention relates to a process and a device of forming a multilayer insulating thin film on an inner wall of a glass container. The device includes a machine base, a gas transportation pipeline, a microwave sealing cover, an antenna, a mode convertor, a tuner, a waveguide tube and a pulse microwave generating source. The invention also provides a process corresponding to the device, comprising following steps: (1) vacuumizing the microwave sealing cover and feeding oxygen to the microwave sealing cover through the gas transportation pipeline; (2) introducing a high-power pulse microwave generated from the pulse microwave generating source to the mode convertor through the waveguide tube, tuning the high-power pulse microwave by the tuner, and enabling the high-power pulse microwave to pass through the antenna and uniformly enter into the interior of the vacuum glass container; (3) feeding various special gases successively into the vacuum glass container and ionizing the special gases to generate compact and uniform oxide thin films, wherein the thin films in different nano-scale thicknesses are alternatedly deposited onto the inner wall of the glass container. With the process and the device, the inner wall of a glass container in complex structure can be coated by the thin film, thereby increasing the service life of the product and the deposition efficiency, reducing production cost and enhancing film layer adhesive force and uniformity.

Description

technical field [0001] The invention relates to a process and equipment for forming a multi-layer barrier film on the inner wall of a glass container. Background technique [0002] At present, the general methods for preparing barrier films for glass containers basically use physical vacuum evaporation and melt-gel deposition methods. The barrier film is prepared by silicon oxide (SiO X ) or other solid particles are heated and vaporized by the electron gun, and bottles and jars are placed on the rotating disk in the vacuum chamber, and the gasified silicon oxide (SiO X ) or other coating materials adhere to the outer wall of the glass container when it is cold to form a barrier film, so as to achieve the purpose of barrier. [0003] Since the evaporated film layer is located on the outer wall of the glass container, it is more likely to be damaged and damaged during use and circulation. Microscopic cracks can be seen in the evaporated layer under a microscope, which great...

AI Technical Summary

Problems solved by technology

Gasified silicon oxide (SiO X ) or other coating materials due to the lack of orientation, the silicon oxide (SiO X ) The amount of deposition is not uniform, and the barrier property requirements cannot be met

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