Film structure, testing method thereof, display substrate and testing method and production method thereof
一种显示基板、膜层结构的技术,应用在测量装置、电容测量、测量电变量等方向,能够解决待测膜层厚度值不够精确等问题
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[0040] The following describes in detail the specific implementations of the measuring device, the testing method, the display substrate, the testing method, and the manufacturing method provided in the embodiments of the present invention with reference to the accompanying drawings.
[0041] Embodiments of the present invention provide a film structure, such as figure 1 and figure 2 As shown, it includes: a first metal layer 1, a second metal layer 2, a first test terminal 3, a second test terminal 4, and an insulating layer 5 between the first metal layer 1 and the second metal layer 2; wherein ,
[0042] The first test terminal 3 is connected to the first metal layer 1, and the second test terminal 4 is connected to the second metal layer 2;
[0043] A ladder structure is formed on at least one side among the three layers of the first metal layer 1 , the insulating layer 5 and the second metal layer 2 .
[0044] The above-mentioned film layer structure that the embodime...
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