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Masking plate supporting device and method for cleaning masking plate

A technology for supporting device and mask plate, applied in the field of semiconductor, can solve the problems of complex process and high cost, and achieve the effect of reducing process complexity and cost

Inactive Publication Date: 2015-08-19
SEMICON MFG INT (SHANGHAI) CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0009] The cleaning method of the above-mentioned mask plate needs to disassemble and assemble the mask plate protective film 101 before and after cleaning, so the process is often complicated and the cost is high.
[0010] It can be seen that in the prior art, when cleaning the mask provided with the mask protective film, there are problems of complicated process and high cost.

Method used

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  • Masking plate supporting device and method for cleaning masking plate
  • Masking plate supporting device and method for cleaning masking plate
  • Masking plate supporting device and method for cleaning masking plate

Examples

Experimental program
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Embodiment 1

[0036] Below, refer to Figure 2A and Figure 2B The mask plate supporting device of the embodiment of the present invention will be described. in, Figure 2A It is a top view of a typical structure of the mask support device according to Embodiment 1 of the present invention; Figure 2B for Figure 2A A schematic cross-sectional view along line A-A of the mask support device in , Figure 2C It is a reference diagram of the use state of the mask support device according to Embodiment 1 of the present invention. in, Figure 2C The mask support device in the Figure 2B Similarly, in order to better illustrate the structure of the mask support device, in Figure 2C shows the mask plate 100 placed on the mask plate support device (including the mask plate protection film 101 provided on the mask plate 100) and the cleaning device for clamping the mask plate support device The support 102.

[0037] Such as Figure 2A and Figure 2B As shown, the mask supporting device 20...

Embodiment 2

[0048] An embodiment of the present invention provides a method for cleaning a mask, which uses the mask supporting device 200 in Embodiment 1 to support the mask during the cleaning process. in, Figure 3A-3D A schematic diagram of each step of the method for cleaning a mask plate according to Embodiment 2 of the present invention is shown.

[0049] The method for cleaning the mask plate of the present embodiment includes the following steps:

[0050] Step S101: Place the mask plate 100 on the mask plate supporting device 200, wherein the side of the mask plate 100 provided with the mask plate protective film 101 faces the frame 201 and the mask plate supporting device 200. The accommodating space formed by the bottom plate 202, such as Figure 3A shown.

[0051] Wherein, the pollutant 600 is located on the upper surface of the mask 100 (the other surface opposite to the surface where the mask protective film 101 is located), as Figure 3A shown.

[0052] Wherein, the ma...

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Abstract

The invention provides a masking plate supporting device and a method for cleaning a masking plate, which relate to the technical field of a semiconductor. The masking plate supporting device comprises a frame for supporting the masking device and a base plate arranged at the bottom of the frame, wherein the base plate, together with the frame, forms a containing space. An antiskid baffle for preventing the masking plate from moving horizontally is arranged at the outside of the frame, and the top end of the antiskid baffle is higher than the top end of the frame. Since the masking plate supporting device is provided with the base plate, which is arranged at the bottom of the frame and forms the containing space together with the frame, the protective film of the masking plate can be protected from being corroded by a cleaning solution when the masking plate is cleaned. Therefore, when the masking plate is cleaned, steps of removing and installing the masking plate are omitted, and the technical complexity and cost are reduced.

Description

technical field [0001] The invention relates to the technical field of semiconductors, in particular to a mask plate supporting device and a method for cleaning the mask plate. Background technique [0002] In the field of semiconductor technology, many process steps in the manufacturing process of semiconductor devices need to be realized by photolithography technology, and in the photolithography technology, the mask plate, as an indispensable device, plays a vital role. [0003] Whether the mask is clean or not is directly related to the yield of the final semiconductor device. In the manufacturing process of semiconductor devices, when contaminants (such as impurity particles or other pollutants) are found on the mask, it is generally necessary to clean the mask. At present, the methods of cleaning the mask mainly include the following three methods: (1) use nitrogen (N2) to purge the pollutants to remove the pollutants; (2) use a cotton swab dipped in acetone to wipe t...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F1/64G03F1/82
CPCG03F1/64G03F1/82
Inventor 张士健
Owner SEMICON MFG INT (SHANGHAI) CORP
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