Fixing device, reaction chamber and plasma processing equipment
A fixed device and reaction chamber technology, applied in the field of plasma processing equipment, can solve problems such as damage to electronic devices, adverse effects of the process environment, and leakage of heat exchange media, so as to increase the processable area, avoid adverse effects, and reduce processing costs. effect of difficulty
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[0038] In order to enable those skilled in the art to better understand the technical solution of the present invention, the fixing device, reaction chamber and plasma processing equipment provided by the present invention will be described in detail below with reference to the accompanying drawings.
[0039] Figure 4A It is a sectional view of the fixing device provided by the first embodiment of the present invention. Figure 4B for Figure 4A Top view of the fixture. Please also refer to Figure 4A and Figure 4B , the fixing device is used to fix the workpiece 201 to be processed on the bearing surface of the base 202 located in the reaction chamber, the fixing device includes a fixing ring plate 203 above the base 202, and the material used for the fixing ring plate 203 includes stainless steel Equal high-density materials, on the inner peripheral wall of the fixed ring plate 203 (that is, the inner peripheral wall of the annular hole 204 of the fixed ring plate 203)...
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