GaN-based LED epitaxial structure having asymmetric super-lattice layer and preparation method for same
A technology of superlattice layer and epitaxial structure, applied in electrical components, circuits, semiconductor devices, etc., can solve the problems of hindering the ability to activate lateral expansion, adverse luminous efficiency, etc., so as to improve the overall luminous efficiency, improve the injection efficiency, and reduce the luminescence. The effect of reducing efficiency
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[0033] In order to enable those skilled in the art to better understand the technical solutions in the present invention, the following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described The embodiments are only a part of the embodiments of the present invention, rather than all the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those of ordinary skill in the art without creative work shall fall within the protection scope of the present invention.
[0034] Participate figure 1 As shown, the present invention discloses a GaN-based LED epitaxial structure with an asymmetric superlattice layer, which sequentially includes:
[0035] The substrate 10, the substrate material is usually a sapphire substrate, but may also be other substrate materials, such as Si, SiC, etc....
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