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A device and method for analyzing trace impurities in gas

An analysis device and technology of trace impurities, applied in the field of gas chromatographic analysis, can solve problems such as cumbersome operation, achieve the effects of simplifying sample injection operations, improving detection sensitivity and accuracy, and speeding up detection speed

Active Publication Date: 2018-03-23
PERIC SPECIAL GASES CO LTD
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] In view of the shortcomings of the existing chromatographic process that requires a second sample injection, the operation is cumbersome, and it is not suitable for the analysis of impurity components in high-purity oxygen / ultra-pure oxygen and oxygen-containing mixed gases, and the deoxygenation column must be combined with the analysis of hydrogen, neon, argon , Nitrogen, Krypton, Helium, high-purity gas, ultra-pure gas and their mixed gas, the gas path is effectively separated. The present invention provides a trace impurity analysis device and method in the gas, which can complete all of them with only one sample injection. The analysis of trace impurities can analyze the trace impurities of a variety of high-purity gases, ultra-pure gases and their mixed gases including oxygen, reduce equipment purchase costs, simplify sample injection operations, and speed up analysis

Method used

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  • A device and method for analyzing trace impurities in gas
  • A device and method for analyzing trace impurities in gas
  • A device and method for analyzing trace impurities in gas

Examples

Experimental program
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Effect test

Embodiment 1

[0108] combine Figure 2 to Figure 9 , taking the analysis of impurity components such as hydrogen, nitrogen, methane, carbon dioxide and carbon monoxide in high-purity argon as an example to illustrate the trace impurities in high-purity gases such as hydrogen, neon, argon, nitrogen, krypton, and helium Analysis of components. Including the following steps:

[0109] a. Carry out a sample injection operation, switch valve I1 to reconnect the pipeline, carrier gas I will bring the sample in the quantitative tube I61 into the first molecular sieve column 71, and pre-separate H 2 , Ar main peak (including O 2 ), N 2 、CH 4 , CO component; the sample in the carrier gas II and the quantitative tube II62 enters the Porapak Q column 8, and the CO 2 with H 2 , Ar / O 2 / N 2 mixed peak, CH 4 , C2+, etc. are separated; such as figure 2 shown.

[0110] b. After being pre-separated by the first molecular sieve column 71, H 2 After passing the switching valve II2, switch the swit...

Embodiment 2

[0117] For the analysis of high-purity oxygen / ultra-pure oxygen, it is necessary to switch the gas path so that the sample gas passes through the deoxygenation column 9 to remove oxygen.

[0118] combine Figure 10 ~ Figure 15 , taking the analysis of hydrogen, argon, nitrogen, methane, carbon dioxide, and carbon monoxide impurity components in high-purity oxygen as an example, the analysis method of high-purity oxygen and ultra-pure oxygen is described, including the following steps:

[0119] a. Carry out a sample injection operation, switch valve I1 to reconnect the pipeline, carrier gas I will bring the sample in the quantitative tube I61 into the first molecular sieve column 71, and pre-separate H 2 , O 2 Main peak (including Ar), N 2 、CH 4 , CO component; the sample in the carrier gas II and the quantitative tube II62 enters the Porapak Q column 8, and the CO 2 with H 2 , Ar / O 2 / N 2 mixed peak, CH 4 , C2+, etc. are separated; such as Figure 10 shown.

[0120] ...

Embodiment 3

[0125] When analyzing the oxygen-containing mixed gas, the main component gas other than oxygen is cut at the switching valve II2, and the switching valve III3 is switched to make the sample gas pass through the deoxygenation column 9 to remove oxygen.

[0126] combine Figure 16 ~ Figure 24 , taking the analysis of the impurity components of hydrogen, argon, methane, carbon dioxide, and carbon monoxide in the oxygen-nitrogen mixed gas as an example, the analysis method of the oxygen-containing mixed gas is described, including the following steps:

[0127] a. Carry out a sample injection operation, switch valve I1 to reconnect the pipeline, carrier gas I will bring the sample in the quantitative tube I61 into the first molecular sieve column 71, and pre-separate H 2 , O 2 Main peak (including Ar), N 2 Main peak, CH 4 , CO component; the sample in the carrier gas II and the quantitative tube II62 enters the Porapak Q column 8, and the CO 2 with H 2 , Ar / O 2 / N 2 mixed p...

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Abstract

The invention discloses a device and method for analyzing trace impurities in gas, belonging to the field of gas chromatography analysis. The device includes: switching valve I, switching valve II, switching valve III, switching valve IV, and four carrier gas circuits of carrier gas I, carrier gas II, carrier gas III and carrier gas IV; There are two quantitative tubes, namely quantitative tube I and quantitative tube II; a first molecular sieve column is set between switching valve I and switching valve II, and a second molecular sieve column is set between switching valve III and switching valve IV. A Porapak Q column is arranged between switching valve I and switching valve IV, and a deoxygenation column and a three-way switching valve are arranged on switching valve III. The invention also provides a method for analyzing trace impurities in gas, which can complete the analysis of all trace impurities with only one sample injection, and can analyze various high-purity gases, ultra-pure gases and their mixed gases including oxygen. trace impurities, saving analysis costs, simplifying sample injection operations, and speeding up analysis.

Description

technical field [0001] The invention relates to a device and method for analyzing trace impurities in gas, in particular to a device and method for analyzing trace impurities in high-purity gas / ultra-pure gas and their mixed gas, and belongs to the field of gas chromatography analysis. Background technique [0002] Industry national standards for high-purity and ultra-high-purity gases, such as high (ultra-high) pure hydrogen, high (ultra-high) pure nitrogen, high (ultra-high) pure argon, high (ultra-high) pure helium, high (ultra-high) Industrial gases such as pure oxygen and gases used in the electronic industry are required to be detected by PDHID helium ionization detectors with high sensitivity at the ng / g (ppb) level (hereinafter referred to as PDD detectors). In order to meet the detection of trace or trace impurity components in the above-mentioned many gases, it is necessary to design a chromatographic gas path process suitable for PDD detectors. [0003] Patent CN...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G01N30/02
Inventor 闫云刘晓林董云峰代伟娜许东海黄国庆陈欢石晶李晓昆
Owner PERIC SPECIAL GASES CO LTD
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