Integrated balance mass device of photoetching machine workpiece table
A technology of balancing quality and balancing mass, which is applied in the direction of photolithography exposure device, micro-lithography exposure equipment, etc., can solve the problem of difficulty in synchronous design, and achieve the goal of increasing quality, reducing difficulty, and reducing moving speed Effect
Inactive Publication Date: 2015-10-21
HARBIN INST OF TECH
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Problems solved by technology
[0004] The purpose of the present invention is to solve the problem that the existing lithography machine balance technology adopts two balance mass blocks and it is difficult to design synchronously, and provides an integrated balance mass device for the lithography machine workpiece table
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specific Embodiment approach 1
[0020] Specific implementation mode one: the following combination Figure 1 to Figure 3 Describe this embodiment, the integrated balance mass device of the lithography machine workpiece table described in this embodiment, which includes a base frame 1, a balance mass block 2, four vertical air bearing pads 3a, 3b, 3c, 3d, and Y-direction Linear motor guide rail mechanism, X-direction motion mechanism and balance mass linear motor;
[0021] The balance mass 2 is a U-shaped structure, and the direction of the groove of the U-shaped structure is Y direction; the balance mass linear motor includes the balance mass linear motor mover 6 and the balance mass linear motor stator guide rail 7; the Y direction linear motor guide rail mechanism It includes two Y-direction motor guide rail bases 4a, 4b and two Y-direction motor stator magnets 5a, 5b, and the X-direction movement mechanism includes two Y-direction linear motor movers, X-direction rails 9 and X-direction linear motors;
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The invention discloses an integrated balance mass device of a photoetching machine workpiece table and belongs to the technical field of semiconductor manufacturing equipment. The integrated balance mass device solves the problem that two balance mass blocks are adopted in an existing photoetching machine balance technology, and the synchronous design difficulty is high. The integrated balance mass device comprises a base frame, a balance mass block, perpendicular air floatation cushions, Y-direction linear motor guide rail parts, an X-direction movement mechanism and a balance mass block liner motor. The four perpendicular air floatation cushions are fixed to the four corners of the bottom face of the balance mass block respectively and used for isolating the base frame at the bottom through air floatation so as to achieve vibration isolation and low-friction movement of the system. Two guide rails of a Y-direction linear motor are installed on the plane of the balance mass block to serve as the stator part of the Y-direction linear motor, X-direction guide rail parts are installed on the Y-direction liner motor guide rails, the balance mass block motor drives the balance mass block to move, and therefore the deviation of the balance mass block due to the reaction force of the X-direction guide rails is offset, and the balance mass block can return to the balance position again.
Description
technical field [0001] The invention belongs to the technical field of semiconductor manufacturing equipment, and mainly relates to a balance quality system of a workpiece table system of a lithography machine. Background technique [0002] As an important equipment in the field of semiconductor manufacturing, the lithography machine has extremely strict requirements on precision and efficiency. This requirement is directly reflected in the workpiece table system of the lithography machine. In the lithography machine workpiece table system, in order to improve efficiency, the movement speed of the workpiece table is very high, and it is also required to ensure extremely high precision. Therefore, in the lithography machine workpiece table system, the balance mass system is usually used to buffer the reaction force generated by the high-speed movement of the workpiece table, thereby improving the motion accuracy of the workpiece table system and reducing the impact of the wor...
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IPC IPC(8): G03F7/20
Inventor 陈兴林陈震宇刘杨付雪微
Owner HARBIN INST OF TECH