Large-stroke quick-response X-Y micro-motion workbench with double displacement magnification

A technology of displacement amplification and quick response, which is applied to the parts of the instrument, instruments, etc., can solve the problems of system motion accuracy decrease, motion platform displacement inconsistency, and affect positioning accuracy, so as to improve the load carrying capacity, improve the quick response, Eliminate the effect of displacement coupling

Active Publication Date: 2015-10-28
NORTHEASTERN UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The positioning platform adopts the two-stage amplification mechanism of the flexible hinge and the composite parallel four-bar guide mechanism, which is difficult to process, and the rigidity of the flexible hinge is much smaller than that of the rod, resulting in an oversized amplification mechanism; the two-stage displacement amplification mechanism will also make the final output The force is doubled, and the load capacity of the platform will also decrease; multiple use of flexible hinge mechanism to realize motion transmission will make the motion accuracy of the system drop rapidly, the system bandwidth will be reduced, and it will be difficult for the system to achieve high-speed and accurate positioning
[0005] Chinese patent CN 102962683 A proposes a two-degree-of-freedom translational parallel high-bandwidth micro-motion platform. The two-dimensional high-bandwidth translational characteristics of the platform sacrifice the installation position of the position sensor and the usable area of ​​​​the platform; no displacement amplification is added to the system Mechanism, unable to achieve large stroke movement
[0006] Chinese patent CN 10176995 A proposes a two-translational micro-motion platform with redundant branch chains. The design of the workbench makes the use area of ​​the entire workbench small and the blank area large; and the stiffness difference between the two sides is large. When a single direction force is applied, the platform will deflect obviously on the other side, resulting in additional angular displacement; if the platform is too large without any weight reduction treatment, the displacement of each position of the overall motion platform will be inconsistent, thus affecting the positioning accuracy , it will also lead to the reduction of the driving ability of piezoelectric ceramics and the poor dynamic characteristics of the system
[0007] Chinese patent CN 103411106 A proposes a nested diamond-shaped enlarged two-dimensional precision positioning platform. Compared with the size of the motion platform, the size of the driving and amplifying mechanism is too small. If no weight reduction treatment is performed, the system will fail The driving ability and dynamic characteristics are reduced; and the movement platform is too large to cause the displacement of each position of the movement platform to be inconsistent; the displacement amplification factor of the parallelogram displacement amplification mechanism that relies on the tensile deformation of the four sides to generate displacement amplification is nonlinear and has not been determined. coefficient; the system presents an asymmetric structure, which will lead to a decrease in the natural frequency of the platform

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  • Large-stroke quick-response X-Y micro-motion workbench with double displacement magnification
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  • Large-stroke quick-response X-Y micro-motion workbench with double displacement magnification

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Embodiment Construction

[0035] The embodiments of the present invention are described in detail below. This embodiment is implemented on the premise of the technical solution of the present invention, and detailed implementation methods and specific operating procedures are provided, but the protection scope of the present invention is not limited to the following implementation example.

[0036] Such as figure 1 , as shown in 2 and 4, a large-stroke X-Y micro-motion worktable with a double displacement amplification mechanism provided by the present invention is characterized in that it mainly includes a base 3, a motion platform 2, a top cover 1, leveling screws 4, Piezoelectric ceramics (11, 12, 13, 14), stage 7, capacitive displacement sensors (5, 6, 8, 9) and locking screws 10. Wherein the leveling screw 4 is installed on the four corners of the base 3, the base 3 is the motion platform 2, the motion platform 2 is the top cover 1, the base 3, the motion platform 2 and the top cover 1 are fixed ...

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Abstract

The invention relates to a large-stroke quick-response X-Y micro-motion workbench with double displacement magnification. The workbench comprises a pedestal, a motion platform, a top cap, leveling screws, piezoelectric ceramics, an object stage, capacitive displacement sensors, and the like, wherein the pedestal, the motion platform, and the top cap are fixed through screws; the piezoelectric ceramics are installed in displacement magnifying mechanisms and are tightly locked by screws; and the capacitive displacement sensors are installed between the object stage and rounding straight-beam flexible hinges. Improved parallelogram displacement magnifying mechanisms applicable to micro-nano structures are adopted in the workbench; joint parts of the mechanisms are connected by round flexible hinges; and the stiffness of the mechanisms determine the loading capability and quick response of the displacement magnifying mechanism. Two displacement magnifying mechanisms are connected in parallel, so that output force and output displacement are doubled, and displacement coupling of the object stage is reduced. A symmetrical structure is adopted in the micro-motion workbench to provide the workbench with relatively high bandwidth and repeated accuracy. A combination structure of rounding straight-beam and parallel-board flexible hinges is adopted, so that the micro-motion workbench is good in unidirectional displacement.

Description

technical field [0001] The invention relates to a device in the technical field of micro-nano measurement and processing, in particular to a large-stroke fast-response X-Y micro-motion worktable with double displacement amplification. Background technique [0002] Micro-nano positioning technology is a key technology in modern high-tech and modern industry, and has a wide range of applications in many fields such as precision manufacturing, ultra-precision measurement and micro-manipulation. In recent years, higher requirements such as large stroke, high precision, small volume and fast response have been put forward for micro-nano positioning technology, among which the requirements for positioning accuracy and resolution have reached the nanometer level. [0003] The level of micro-nano positioning technology reflects a country's technological development and comprehensive strength, and governments of various countries have invested a lot of manpower and material resources...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G12B5/00
Inventor 郝丽娜曹瑞珉
Owner NORTHEASTERN UNIV
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