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Sputtering target for rare-earth magnet and production method therefor

A technology of rare earth magnets and manufacturing methods, which is applied in the field of sputtering targets and can solve the problems of many manufacturing processes

Active Publication Date: 2015-11-04
JX NIPPON MINING & METALS CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

On the other hand, compared with the smelting method, the sintering method has many manufacturing steps, and there is a problem in the manufacturing process that oxygen, which greatly affects the magnetic properties of the rare earth magnet thin film, is easily mixed in, and it is required to effectively block the mixing of oxygen.

Method used

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  • Sputtering target for rare-earth magnet and production method therefor
  • Sputtering target for rare-earth magnet and production method therefor
  • Sputtering target for rare-earth magnet and production method therefor

Examples

Experimental program
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Effect test

Embodiment 1

[0053] Neodymium with a purity of 3N5, iron with a purity of 4N, and ferroboron with a purity of 2N were prepared as raw materials. It should be noted that any of the raw materials used bulk raw materials. These raw materials were weighed to achieve the composition of Nd15-Fe75-B10, and then put into a cold crucible melting furnace with a water-cooled copper crucible at 1×10 -4 Melting was carried out at 1320° C. for more than 60 minutes under a Torr vacuum to produce an alloy ingot of about 6 kg.

[0054] Next, the upper portion, the lower portion, and the outer peripheral portion of the ingot are ground, cut into blocks, and put into a gas atomization device. Vent the unit to a 1×10 -2 Torr, then introduce inert gas, raise the temperature to 1420°C, and then keep it for about 10 minutes. After that, an inert gas was sprayed at about 1.5 MPa to the dripping melt, thus obtaining the following figure 2 The micropowder shown has an average particle size of about 60 μm.

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Abstract

The present invention relates to a rare-earth magnetic target comprising neodymium, iron, and boron as essential components. The target has an average crystal grain diameter of 10 to 200 µm. It is an object of the present invention to provide a sintered compact target that can form rare-earth magnetic thin films, in particular, neodymium magnetic thin films, having good magnetic characteristics with excellent mass productivity and reproducibility, and provide a method of producing the sintered compact target.

Description

technical field [0001] The present invention relates to a sputtering target suitable for producing a rare earth magnet film by a sputtering method or a pulsed laser deposition method and a production method thereof. Background technique [0002] In recent years, as electronic equipment has become thinner and smaller, the miniaturization and high performance of rare earth magnets with excellent magnetic properties have been promoted. Among them, since neodymium magnets have the highest magnetic energy product among existing magnets, they are expected to be used in energy fields such as MEMS (micro-electro-mechanical systems), energy harvesting (environmental power generation), medical equipment fields, and the like. [0003] Such rare earth magnet thin films are known to be produced by PVD (Physical Vapor Deposition) methods such as sputtering (Patent Document 1, Non-Patent Document 1) or pulsed laser deposition (Patent Document 2, Non-Patent Document 2), and are in progress....

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/34H01F41/18H01F41/02
CPCH01F41/183B22F3/14B22F3/15B22F5/00B22F9/04C23C14/14C23C14/3414H01F1/053H01F41/02H01F41/18H01J37/3429
Inventor 泽渡广信
Owner JX NIPPON MINING & METALS CORP