Mask plate and preparation method thereof

Abstract

The invention relates to a mask plate and a preparation method thereof. The mask plate comprises multiple layers of pattern units, wherein any two layers of pattern units are insulated to each other; each layer of pattern unit is connected with an electrode unit, and each electrode unit is only connected with one layer of pattern unit; each layer of pattern unit comprises a first transparent electrode layer, a second transparent electrode layer and an electrochromic layer which is arranged between the first transparent electrode layer and the second transparent electrode layer; the electrode unit applies a voltage to at least one of the first transparent electrode layer and the second transparent electrode layer in the pattern unit connected to the electrode unit, so that the light transmittance of the electrochromic layer between the first transparent electrode layer and the second transparent electrode layer is changed. One mask plate can generate various mask patterns, so that a needed mask pattern can be formed only by changing the voltage, applied to the corresponding pattern unit, of different electrode units, the time for replacing the mask plate is saved, and the production efficiency is improved; meanwhile, the demand on the mask plate is reduced, and a great amount of resource and field space can be saved.

Description

technical field [0001] The present invention relates to the field of display technology, in particular to a mask plate and a preparation method thereof. Background technique [0002] During the process of manufacturing the display panel, multiple exposure processes are required. In the exposure process, a mask needs to be used. With the help of the pattern on the mask, a light-transmitting area and a non-transmitting area (sometimes including a semi-transmitting area) are formed, so that the corresponding photoresist / Frame sealants have different characteristics, so that patterns with corresponding shapes can be formed by etching. [0003] It can be understood that in different exposure processes, the patterns on the mask will be different; and for different products, the patterns on the mask required in the manufacturing process will also be different. In this way, when preparing the display panel, for the preparation of different patterns (such as the source electrode, ...

AI Technical Summary

Problems solved by technology

In this way, when preparing the display panel, for the preparation of different patterns (such as the source electrode, active layer, source drain electrode, and pixel electrode of the thin film transistor), it is necessary to prepare different mask plates; When using different types of products, do not prepare different masks for different products. This will require the preparation of a large number of masks, which will consume a lot of resources and costs. At the same time, the storage of a large number of masks will also take up a lot of time. Site space and other resources

In addition, in the manufacturing process, replacing the mask will also take a lot of time, which will reduce the production efficiency of the production line

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