Method for achieving industrialization of multi-layer composite fullerene-like film on automotive engine

Abstract

Disclosed is a method for achieving industrialization of a multi-layer composite fullerene-like film on an automotive engine. According to the invention, industrialization of the multi-layer composite fullerene-like film on the automotive engine is achieved through the cooperation between an integration technology with the combination of cathodic arcs and unbalanced magnetron sputtering and a technology which utilizes a high-power pulse ion source to increase the plasma density of a region with a coating film. The prepared multi-layer composite fullerene-like film has excellent comprehensive performance of the low friction coefficient, low abrasion, high elastic recovery and high binding force, the quality of the engine can be substantially improved, and the service life of the engine can be substantially prolonged.

Description

technical field [0001] The invention relates to an industrialized production method of surface treatment, in particular to a method for the industrialization of a multilayer composite fullerene-like carbon film with high hardness, low friction, low wear and high binding force on an automobile engine. Background technique [0002] With the stringent requirements for energy saving, emission reduction and environmental protection of automobiles, as well as the high standard requirements for high precision, high reliability and long life, the new generation of energy-saving, consumption-reducing and low-carbon engines is integrated with new reinforcement and lubrication. There is an urgent need for chemical surface protection technology. For example, the engine is a complex system composed of components of different shapes and sizes, such as high-pressure common rail fuel injection system, valve tappet, tappet, piston ring, piston pin, camshaft, etc. These components are made of...

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Problems solved by technology

Among them, arc ion plating has high ionization rate and energy, and is usually used to deposit hard films, but the deposited films have large roughness, which is not suitable for the processing of precision components; although traditional magnetron sputtering can obtain films with excellent properties, However, there are problems of poor plating and bonding force, and the film thickness difference is large in the vertical direction away from the target; chemical vapor deposition technology usually requires high temperature to achieve good bonding force, although plasma-enhanced chemical vapor deposition can Low-temperature deposition is achieved, but it is difficult to achieve large-area d

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