System used for controlling machine production data and method thereof

Abstract

The invention discloses a system used for controlling machine production data and a method thereof. The system comprises a test database, a data processing unit, a verification unit, a machine monitoring system server and an adjusting client. The method comprises steps that, production data parameters are acquired and are stored in the test database; operation processing on the acquired data is carried out to acquire a process parameter scope; data parameters are adjusted by employing the adjusting client and according to historical data to acquire a required progress parameter scope. Through the system and the method, reference values of all parameters under all conditions in the process scope can be figured out through calculation, determination is carried out according to experience and the calculation results, forward-looking determination for the process parameter scope is realized, error operation is reduced, influence of the error operation on a real-time production system is further reduced, and thereby validity and accuracy of the process parameter scope are improved.

Description

technical field [0001] The invention relates to a data management technology in the semiconductor manufacturing industry, in particular to a system and method for collecting, processing and managing semiconductor data. Background technique [0002] The process parameters of semiconductor equipment refer to the collection of data that characterizes the performance of production equipment in the semiconductor process, including temperature, pressure, current, concentration, time, etc. The accuracy and stability of these parameters determine the quality of each process. If some parameters are abnormal during wafer processing, it may affect the final yield of the wafer. The existing technology is to provide engineers with all parameter data, thereby setting the process parameter range in the semiconductor process according to the engineer's experience. Referring to the process parameter range of the obtained parameter data, in the reagent operation, once the data is abnormal, i...

AI Technical Summary

Problems solved by technology

[0007] The rationality of the process parameter range cannot be judged in advance, and it often needs to be adjusted afterwards after the product has a problem. It is also easy to cause false alarms due to unreasonable setting of the process parameter range;

[0008] It is impossible to quickly find the key influencing parameters among a large number of parameters, and the parameter range lacks validity and accuracy;

[0009] Due to the existence of the above problems, the actual effect of the entire semiconductor machine process parameter management system is much lower than expected, so a systematic method is needed to complete the screening of these parameters and the determination of the controllable range of parameter values.

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