System used for controlling machine production data and method thereof

A production data and monitoring system technology, applied in the direction of comprehensive factory control, comprehensive factory control, electrical program control, etc., can solve the problems of finding, error, lack of validity and accuracy of parameter range, etc., to expand the range of data parameters, improve Effective and feasible effect

Active Publication Date: 2016-01-06
SEMICON MFG INT (SHANGHAI) CORP
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0007] The rationality of the process parameter range cannot be judged in advance, and it often needs to be adjusted afterwards after the product has a problem. It is also easy to cause false alarms due to unreasonable setting of the process parameter range;
[0008] It is impossible to quickly find the key influencing parameters among a large number of parameters, an

Method used

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  • System used for controlling machine production data and method thereof
  • System used for controlling machine production data and method thereof
  • System used for controlling machine production data and method thereof

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Embodiment Construction

[0062] The system and method of the present invention also involve changes in the range of process parameters in the actual production environment that must be authorized before they can be used in actual production, and whether the range of changes in these data parameters is within the controllable or beyond the controllable range. The abnormal rate of the process parameter range and the appropriate measures for different abnormal rates need to be signed off to form a systematic production management.

[0063] The present invention will be further described below in conjunction with the accompanying drawings and specific embodiments, but not as a limitation of the present invention.

[0064] figure 1 It is an architecture diagram showing a system for managing and controlling production data of a semiconductor machine applied in an embodiment of the present invention. The system described in the embodiment of the present invention first includes several machines (such as fi...

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Abstract

The invention discloses a system used for controlling machine production data and a method thereof. The system comprises a test database, a data processing unit, a verification unit, a machine monitoring system server and an adjusting client. The method comprises steps that, production data parameters are acquired and are stored in the test database; operation processing on the acquired data is carried out to acquire a process parameter scope; data parameters are adjusted by employing the adjusting client and according to historical data to acquire a required progress parameter scope. Through the system and the method, reference values of all parameters under all conditions in the process scope can be figured out through calculation, determination is carried out according to experience and the calculation results, forward-looking determination for the process parameter scope is realized, error operation is reduced, influence of the error operation on a real-time production system is further reduced, and thereby validity and accuracy of the process parameter scope are improved.

Description

technical field [0001] The invention relates to a data management technology in the semiconductor manufacturing industry, in particular to a system and method for collecting, processing and managing semiconductor data. Background technique [0002] The process parameters of semiconductor equipment refer to the collection of data that characterizes the performance of production equipment in the semiconductor process, including temperature, pressure, current, concentration, time, etc. The accuracy and stability of these parameters determine the quality of each process. If some parameters are abnormal during wafer processing, it may affect the final yield of the wafer. The existing technology is to provide engineers with all parameter data, thereby setting the process parameter range in the semiconductor process according to the engineer's experience. Referring to the process parameter range of the obtained parameter data, in the reagent operation, once the data is abnormal, i...

Claims

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Application Information

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IPC IPC(8): G05B19/418
CPCY02P90/02
Inventor 李益清罗异
Owner SEMICON MFG INT (SHANGHAI) CORP
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