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Three-dimensional integrated inductor and manufacturing method thereof

An integrated inductance, three-dimensional technology, used in semiconductor/solid-state device manufacturing, electric solid-state devices, circuits, etc., can solve the problem of small inductance value of integrated inductors, and achieve the effect of increasing inductance value

Inactive Publication Date: 2016-01-06
XIAN UNIV OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] In order to solve the problem of small inductance value of existing integrated inductors, the present invention provides a three-dimensional integrated inductor and its manufacturing method realized by silicon via technology

Method used

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  • Three-dimensional integrated inductor and manufacturing method thereof
  • Three-dimensional integrated inductor and manufacturing method thereof
  • Three-dimensional integrated inductor and manufacturing method thereof

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Embodiment Construction

[0031] Such as figure 1 As shown, a three-dimensional integrated inductor includes a top layer dielectric 101, a top layer interlayer dielectric 201, a semiconductor substrate 301, and a bottom layer dielectric 401. Spiral through-silicon holes are etched on the semiconductor substrate 301, and the through-silicon holes An insulating layer 302 is disposed on the inner surface of the insulating layer 302, a metal 303 is disposed inside the insulating layer 302, a top interlayer dielectric 201 is disposed on the upper surface of the semiconductor substrate 301, and the first contact hole and the second contact hole are etched in the top interlayer dielectric 201. Two contact holes, the first contact hole and the second contact hole are located on the metal 303, the first contact hole is filled with the first interconnection metal plug 202, the second contact hole is filled with the second interconnection metal plug 203, and The top layer interlayer dielectric 201 is provided wit...

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Abstract

The invention relates to a three-dimensional integrated inductor and a manufacturing method thereof. The three-dimensional integrated inductor is composed of a top layer dielectric unit, a top layer inter-layer dielectric unit, a semiconductor substrate, and a bottom dielectric unit. A spiral silicon through hole is etched in the semiconductor substrate; an insulating layer is arranged at the internal surface of the silicon through hole; and metal is arranged inside the insulating layer. The top layer medium is arranged on the upper surface of the semiconductor substrate; and a first contact hole and a second contact hole are etched in the top layer inter-layer dielectric unit and are filled with a first interconnection metal plug and a second interconnection metal plug correspondingly. The top layer dielectric unit is arranged on the upper surface of the top layer inter-layer dielectric unit; and a third contact hole and a fourth contact hole are etched in the top layer dielectric unit and are filled with a first metal electrode and a second metal electrode correspondingly. And the top layer dielectric unit is arranged at the lower surface of the semiconductor substrate. According to the invention, the inductance value of the integrated inductor can be improved substantially; and the three-dimensional integrated inductor can be widely applied to an integrated circuit, especially to a radio-frequency / microwave / millimeter-wave circuit.

Description

technical field [0001] The invention belongs to the field of three-dimensional integrated inductors, and in particular relates to a three-dimensional integrated inductor realized by silicon through hole technology and a manufacturing method thereof. Background technique [0002] Inductors can be applied to analog integrated circuits, analog / digital hybrid integrated circuits and radio frequency / microwave / millimeter wave circuits, and are an important part of modern communication circuits and systems. Inductors mainly play the role of filtering, oscillation, delay, trapping, etc. in the circuit, as well as filtering signals, filtering noise, stabilizing current, and suppressing electromagnetic wave interference. The most common function of an inductor in a circuit is to form an LC filter circuit together with a capacitor. Existing integrated inductors are etched on PCBs using a method of laying spiral traces, or fabricated in integrated circuits in the same process as transi...

Claims

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Application Information

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IPC IPC(8): H01L23/528H01L21/768
Inventor 王凤娟余宁梅
Owner XIAN UNIV OF TECH
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