Al-Ca-Ba infrared glass provided with protective film and preparation method of Al-Ca-Ba infrared glass
A technology of infrared glass and protective film, applied in the field of aluminum calcium barium infrared glass with protective film and its preparation, can solve problems such as insufficient film base adhesion, large difference in expansion coefficient, etc., achieve simple structure and improve protective performance , easy-to-prepare effects
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[0027] Example 1
[0028] The preparation method of the aluminum-calcium-barium infrared glass with protective film, the infrared glass substrate is ultrasonically cleaned with acetone and ethanol for 15 minutes, then placed in the substrate holder, and vacuumed to 2.0×10 -3 Pa, heat to 300℃, keep for 1h; use Hall ion source to clean the aluminum-calcium-barium infrared glass substrate before plating, gas is Ar, flow is 30SCCM, anode voltage is 150V, anode current is 4A, cleaning for 10 minutes; using radio frequency Magnetron sputtering Al target to prepare aluminum oxide layer, pass Ar into the vacuum chamber, keep the indoor vacuum degree at 0.5 Pa, start the glow, carry out backsplash cleaning on the Al target for 15 minutes; pass O 2 , Where Ar / O 2 The ratio is 1:1.5, the indoor vacuum degree is 1Pa, and the thickness of the aluminum oxide layer obtained is 400nm; the silicon dioxide layer is prepared by radio frequency magnetron sputtering Si target, and Ar is passed into the...
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[0030] Example 2
[0031] The preparation method of the aluminum calcium barium infrared glass with protective film, the infrared glass substrate is ultrasonically cleaned with acetone and ethanol for 15 minutes, then placed in the substrate holder, and vacuumed to 3.0×10 -3 Pa, heat to 250℃, keep for 1.5h; use Hall ion source to clean the aluminum calcium barium infrared glass substrate before plating, the gas is Ar, the flow is 35SCCM, the anode voltage is 150V, the anode current is 3A, and the cleaning is 15 minutes; use The aluminum oxide layer was prepared by RF magnetron sputtering Al target, and Ar was introduced into the vacuum chamber, the vacuum degree in the room was maintained at 0.5 Pa, and the glow was started. The Al target was backsplashed and cleaned for 18 minutes; 2 , Where Ar / O 2 The ratio is 1:1, the indoor vacuum degree is 2Pa, and the thickness of the obtained aluminum oxide layer is 650nm; the silicon dioxide layer is prepared by radio frequency magnetron sp...
Example Embodiment
[0033] Example 3
[0034] The preparation method of the aluminum calcium barium infrared glass with protective film, the infrared glass substrate is ultrasonically cleaned with acetone and ethanol for 15 minutes, then placed in the substrate holder, and vacuumed to 3.0×10 -3 Pa, heat to 280℃, keep for 1.5h; use Hall ion source to clean the aluminum calcium barium infrared glass substrate before plating, the gas is Ar, the flow is 40SCCM, the anode voltage is 200V, the anode current is 4A, and the cleaning is 15 minutes; use The aluminum oxide layer is prepared by RF magnetron sputtering Al target, Ar is introduced into the vacuum chamber, the vacuum degree in the chamber is maintained at 1.5 Pa, and the glow is started. The Al target is backsplashed and cleaned for 20 minutes; 2 , Where Ar / O 2 The ratio is 1:2.5, the indoor vacuum degree is 5 Pa, and the thickness of the obtained aluminum oxide layer is 800 nm; the silicon dioxide layer is prepared by radio frequency magnetron sput...
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