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A kind of synthetic method of highly transparent polysulfone resin containing cycloalkane group substituted phenol

A cycloalkane-based, polysulfone resin technology, applied in the field of industrial synthesis of highly transparent polysulfone resin, can solve the problems of low transmittance of thin products, improvement of polysulfone plastic transparency, product performance decline, etc., to save purchases Cost, large market value, effect of reducing crystallinity

Active Publication Date: 2018-04-20
JIANGMEN YOUJU NEW MATERIALS
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, due to the defects of the existing technology and its own synthesis route, if the production process is not well controlled, polysulfone resin with high crystallinity will appear, which will lead to problems such as low transmittance and uneven color in the thin products processed and formed later. , the finished product rate of processing is greatly reduced, and the product performance is reduced, thus affecting its actual promotion and application
[0003] Chinese patent document CN1057783C discloses a polysulfone composition with very low luster and high light transmittance and products manufactured therefrom. This invention is by adding organic phosphorus stabilizer and organic fluorescent whitening agent to polysulfone products, Although the yellowness index and haze of the obtained product are very low, the polysulfone product itself is sensitive to additives, and problems such as aging and cracking will occur during long-term use
At present, there are many studies on the modification and enhancement of plastics by using various additives, but there are few studies on improving the transparency of polysulfone plastics from the formulation.

Method used

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  • A kind of synthetic method of highly transparent polysulfone resin containing cycloalkane group substituted phenol
  • A kind of synthetic method of highly transparent polysulfone resin containing cycloalkane group substituted phenol
  • A kind of synthetic method of highly transparent polysulfone resin containing cycloalkane group substituted phenol

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0031] In a 300-liter stainless steel reaction kettle equipped with a nitrogen pipe, a condensing water separator and a high-efficiency stirrer, first add 100.0kg of N-methylpyrrolidone and start stirring to raise the temperature to 80°C, and then add 35.0kg of 4,4'-dichloro Diphenyl sulfone, 27.8kg bisphenol A, after the monomers are completely dissolved, add 14.0kg sodium carbonate to the system, then add 60.0 liters of o-trimethylbenzene, continue to stir and heat up to 180°C, the salt-forming reaction begins, and the system generates The water and o-trimethylbenzene are azeotropic, and cooling water begins to drip from the condenser tube, and the layers are separated in the water separator. After the upper layer of o-trimethylbenzene changes from turbid to clear, continue to reflux for another 20 minutes to ensure that the salt-forming reaction is complete. , 1 hour in the salt-forming stage, and the solid content of the system in the salt-forming reaction stage is 25%; aft...

Embodiment 2

[0036] Same as Example 1, except that 80.0 kg of N-methylpyrrolidone, 56.0 liters of m-trimethylbenzene, and 260 g of naphthenic bisphenol (2), the solid content of the system in the polymerization stage is 38%, and other conditions are the same.

[0037] The cycloalkane bisphenol (2) structure is as follows:

[0038]

[0039] The melt index of the obtained PSU resin was MI=14.0g / 10min (343.0°C, 2.16kg); the light transmittance was 96% (measured by ASTM D 1003:2007).

[0040] Same as Example 1, except that N-methylpyrrolidone is 75.0 kg, 64.0 liters of mesitylene, 270 g of naphthenic bisphenols (3), and the solid content of the system in the polymerization stage is 40%, other conditions are the same.

[0041] The cycloalkane bisphenol (3) structure is as follows:

[0042]

[0043] The melt index of the obtained PSU resin was MI=16.0g / 10min (343.0°C, 2.16kg); the light transmittance was 97% (measured by ASTM D 1003:2007).

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Abstract

The invention discloses a method for synthesizing a highly transparent polysulfone resin (PSU) containing cycloalkane-based substituted phenols, using 4,4'-dichlorodiphenyl sulfone and bisphenol A at a molar ratio of 1:1 as the reaction unit. In a nitrogen-protected reaction kettle, add an organic solvent and stir to raise the temperature, then add the reaction monomers in sequence, after the monomers are completely dissolved, add a salt-forming agent and a water-separating agent, stir and heat up, and react for 1 to 2 hours to form a salt; After the reaction is completed, the temperature is raised, and then 0.1-5% of cycloalkane-substituted phenol is added, and the constant temperature polymerization is carried out for 4-5 hours to obtain polymerized slime; the polymerized slime is cooled, pulverized, washed and dried to obtain the finished product. The invention starts from the molecular structure level, introduces cycloalkane group to replace phenol in the polymer molecular chain, destroys the regularity of the polymer chain, reduces the crystallinity, and prepares the highly transparent polysulfone resin terminated by the hydroxyl group. The product synthesized by this invention not only retains the original excellent performance of polysulfone, but also has the advantages of high light transmittance, and has better application prospects and great market value.

Description

technical field [0001] The invention belongs to the technical field of polymer materials, and in particular relates to an industrial synthesis method of highly transparent polysulfone resin containing cycloalkane group-substituted phenol. Background technique [0002] Polysulfone (PSU) is a thermoplastic engineering plastic with excellent mechanical properties, high rigidity, wear resistance, high strength, high thermal stability, high glass transition temperature, and maintains excellent mechanical properties even at high temperatures. And hydrolysis resistance, good dimensional stability, small molding shrinkage, non-toxic, radiation resistance, flame resistance, self-extinguishing, excellent electrical properties in a wide temperature range, good chemical stability, and can withstand general acids, alkalis, Salt, so it has been widely used in the fields of electronic appliances, mechanical processing, automobiles, medical appliances, food processing and non-stick coatings...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C08G65/46C08G65/40
Inventor 王贤文
Owner JIANGMEN YOUJU NEW MATERIALS
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