Intake devices and semiconductor processing equipment
An air intake device and gas technology, which is used in semiconductor/solid-state device manufacturing, electrical components, gaseous chemical plating, etc. efficiency, improve the uniformity of airflow distribution, and improve the effect of process efficiency
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no. 1 example
[0046] Figure 5A It is a schematic diagram of the air intake device provided by the first embodiment of the present invention. see Figure 5A , the air intake device comprises an air inlet 20 and an air inlet chamber 100, both of which are located on one side of the reaction chamber 50, wherein the air inlet chamber 100 is used to flow the reaction gas flowing out from the air inlet 20 in the horizontal direction (Y direction) into the reaction chamber 50. The so-called horizontal direction refers to the direction parallel to the surface of the processed workpiece placed in the reaction chamber 50 . During the process, the reaction gas flows into the reaction chamber 50 from one side of the reaction chamber 50 along the horizontal direction, and when it passes through the surface of the workpiece to be processed, it undergoes a chemical reaction with it, and the residual gas after the reaction is accompanied by the carrier gas. It is discharged from the other side of the r...
no. 2 example
[0065] Figure 6A The schematic diagram of the air intake device provided by the second embodiment of the present invention. see Figure 6A Compared with the above-mentioned first embodiment, the gas inlet device provided in this embodiment differs only in that: in this embodiment, the 1st to N-1 level uniform gas layers convey the reaction gas step by step along the vertical direction, and the 1st to N-1 The N-level uniform gas layer transports the reaction gas in the horizontal direction. The so-called vertical direction refers to the direction perpendicular to the surface of the processed workpiece placed in the reaction chamber.
[0066] specifically, Figure 6B It is a sectional view of the air intake device provided by the second embodiment of the present invention. Figure 6C for Figure 6B Sectional view along line A-A. Please also refer to Figure 6B and 6C , for the 1st to N-1 level gas distribution layers in the air intake chamber 100, compared with the 1st ...
no. 3 example
[0071] Figure 7A It is a schematic diagram of the air intake device provided by the third embodiment of the present invention. see Figure 7A Compared with the above-mentioned second embodiment, the air intake device provided by this embodiment is only different in that: N=3, and in the third-level gas uniform layer, the number of shunts allocated by each subunit is four, That is, each sub-unit 43 in the third-level gas homogenization layer directly and evenly distributes the branches allocated by all the sub-units in the second-level gas homogenization layer into four branches along the direction perpendicular to the direction of conveying the reaction gas in one-to-one correspondence. .
[0072] specifically, Figure 7B It is a sectional view of the air intake device provided by the third embodiment of the present invention. see Figure 7B , as for the first to second level gas homogenization layers in the air intake chamber 200 , compared with the first to second leve...
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