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Device for recovering photoresist in coating machine pipeline

A technology for recycling pipelines and photoresists, which is applied in the fields of photosensitive material processing, electrical components, semiconductor/solid-state device manufacturing, etc., can solve the problems of photoresist waste in pipelines, achieve enhanced competitiveness, easy operation, and save manufacturing costs Effect

Inactive Publication Date: 2016-02-24
刘幸
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0005] In view of the above problems, the present invention provides a device for recovering the photoresist in the pipeline of the coating machine, which solves the problem of wasting the photoresist in the pipeline before and after the maintenance of the coating machine

Method used

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  • Device for recovering photoresist in coating machine pipeline

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Embodiment Construction

[0018] like figure 1 As shown, a device for reclaiming photoresist in the coating machine pipeline, including photoresist container, photoresist pipeline, photoresist extraction device, coating scraper, and coating machine pipeline, also includes photolithography The photoresist recovery container is connected with the photoresist extraction device through the photoresist recovery pipeline, the photoresist recovery pipeline is provided with a filter and a flow meter, and the photoresist extraction device is provided with three ports, the first port is connected with the photoresist pipeline, the second port is connected with the coater pipeline, and the third port is connected with the photoresist recovery pipeline, and the first port and the third port of the photoresist extraction device are respectively A first gate valve and a second gate valve are provided, and the way of extracting the photoresist by the photoresist extraction device is a two-way extraction type.

[0...

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Abstract

The invention discloses a device for recovering photoresist in a coating machine pipeline. The device comprises a photoresist container, a photoresist pipeline, a photoresist extraction apparatus, a coating blade, and the coating machine pipeline, and also includes a photoresist recovery container. The photoresist recovery container is in connection with the photoresist extraction apparatus through a photoresist recovery pipeline, the photoresist recovery pipeline is provided with a filter and a flowmeter, the photoresist extraction apparatus is equipped with three ports, a first port is connected to the photoresist pipeline, a second port is connected to the coating machine pipeline, and a third port is connected to the photoresist recovery pipeline. According to the invention, the photoresist in the coating blade and the coating machine pipeline is fully and reasonably utilized in the regular maintenance phase of the coating machine.

Description

technical field [0001] The invention relates to the field of semiconductor manufacturing, in particular to a photoresist coating and recycling device in the semiconductor manufacturing process. Background technique [0002] In the panel manufacturing process, photoresist coating is a key process technology. The main equipment for this process is a coating machine. The photoresist extraction device is an auxiliary equipment of the coating machine. The photoresist in the container is extracted to the photoresist pipeline and then transferred to the coating machine pipeline, and finally a layer of photoresist is evenly coated on the glass substrate through the movement of the coating blade. Since the width of the coating blade is the same as that of the glass substrate, in order to ensure uniform coating, many coating machine pipes are arranged on the coating blade, and under normal circumstances, each pipe needs to be filled with photoresist. [0003] In order to improve the ...

Claims

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Application Information

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IPC IPC(8): G03F7/26
Inventor 刘幸
Owner 刘幸
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