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A polishing finisher

A dresser and polishing technology, applied in the field of polishing dressers, can solve the problems of decreased binding force, fall off, and cannot really solve the problem of abrasive particles, and achieve the effect of solving the falling off of abrasive particles and increasing efficiency

Inactive Publication Date: 2016-03-02
CRYSTALWISE TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] However, although the above-mentioned improvement can increase the usability of each abrasive grain, it can also effectively reduce the possibility of the abrasive grain falling off, but because the abrasive grain and the metal support layer are still made of different materials, they may be damaged due to the presence of abrasive particles when heated or cooled. The different thermal expansion coefficients make the bonding force of the two decrease, which cannot really solve the problem of abrasive particle falling off

Method used

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Embodiment Construction

[0031] In order to illustrate the present invention more clearly, a preferred embodiment is given and detailed description is as follows in conjunction with the drawings, please refer to Figure 1 to Figure 4 As shown, a polishing conditioner 1 according to a preferred embodiment of the present invention includes a base 10 and a sapphire polishing pad 20 .

[0032] The crystal structure of the sapphire polishing pad 20 of the polishing trimmer 1 is a single crystal, twin crystal or polycrystalline structure, and includes a root portion 22 and a grinding layer 24, and the root portion 22 is brazed, glued or tenoned The abrasive layer 24 is fixed on the base 10 in a manner, and includes a plurality of protrusions 24A and a plurality of recesses 24B.

[0033] In this embodiment, the surface of each protrusion 24A is further formed with a microstructure 26 with a surface roughness ranging from 0.1 to 5 micrometers (μm), and the microstructure 26 is made by yellow light lithography...

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Abstract

The invention provides a polishing finisher comprising a base and a sapphire grinding pad. The sapphire grinding pad comprises root portion and a grinding layer, wherein the root portion is fixed on the base and the grinding layer comprises a plurality of projections and a plurality of recesses. The surface of at least one of each projection and each recess is provided with a microstructure with a surface roughness between 0.1-5 microns. The grinding layer and the root portion of the polishing finisher are formed integrally, so that the problem of falling-off of grinding particles of conventional finishers is radically solved; the microstructures at the surface of the grinding layer improves the polishing pad finishing efficiency.

Description

technical field [0001] The present invention relates to the conditioning or activation of polishing tool surfaces; in particular, it relates to a polishing conditioner. Background technique [0002] Polishing refers to the technology of using physical machinery or chemicals to reduce the surface roughness of the processed object. It is mainly used in precision machinery and optical industries. During the polishing process, the processed object needs to be pressed on a high-speed rotating polishing pad for polishing. In order to prevent the polishing pad from being deformed or piled up after use to affect the efficiency of the subsequent polishing action, it is a necessary step to use a dresser to maintain a stable surface morphology of the polishing pad. [0003] Existing polishing and dressing devices are made by bonding diamond abrasive grains to the surface of the metal substrate, but since the diamond abrasive grains are bonded to the surface of the metal substrate by si...

Claims

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Application Information

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IPC IPC(8): B24B53/017
Inventor 张延瑜王兴民李瑞评陈智勇
Owner CRYSTALWISE TECH
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