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Cylindrical base, master plate and method for producing master plate

A technology of matrix material and manufacturing method, which is applied in the manufacture of optical record carriers, manufacturing tools, glass manufacturing equipment, etc., can solve the problems of changes in the state of exposure beams and deterioration of pattern accuracy, and achieves small surface changes and uniform transfer. Effect

Active Publication Date: 2016-03-16
DEXERIALS CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] However, in the exposure using the optical disc mastering technology, the state of the exposure beam changes due to changes in the surface properties (waviness, cracks) or shape (circularity) of the cylindrical quartz base material
In addition, in the case of thermal imprinting, the pattern accuracy will deteriorate due to the interaction of the strain of the quartz base material and the heat generation of the inorganic resist

Method used

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  • Cylindrical base, master plate and method for producing master plate
  • Cylindrical base, master plate and method for producing master plate
  • Cylindrical base, master plate and method for producing master plate

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0104] A cylindrical base material of quartz glass having an internal strain of less than 20 nm / cm and an amplitude of undulation with a period of 10 mm or less on the outer peripheral surface of 100 nm or less was prepared. Figure 8 is an image showing the internal strain of the cylindrical base material of Example 1. A colored image corresponding to the amount of birefringence due to the internal residual stress was obtained by a strain gauge, showing an internal strain of less than 20 nm / cm.

[0105] A resist layer made of a metal oxide of tungsten was formed on the outer peripheral surface of the cylindrical base material. Then, a latent image in a quasi-hexagonal lattice pattern was patterned on the resist layer by thermal imprinting of a laser using an exposure device. Next, developing treatment is performed on the resist layer on the cylindrical base material to dissolve the resist in the exposed portion. In this way, a resist master disk was obtained in which the re...

Embodiment 2

[0111] A cylindrical base material of quartz glass having an internal strain of less than 20 nm / cm and a waviness amplitude of about 50 nm at a period of 10 mm or less on the outer peripheral surface was prepared. Figure 14 It is a graph showing the surface waviness of the cylindrical base material of Example 2. The amplitude of the undulations in the circumferential direction in the outer peripheral surface of Example 2 was as small as about 50 nm. Using this cylindrical base material, a glass roller master (master) was produced in the same manner as in Example 1.

[0112] Figure 15 It is a two-dimensional image showing the reflected light intensity distribution of the original disk of Example 2. Such as Figure 15 The reflected light intensity distribution of the original disk of Example 2 shown is uniform.

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Abstract

Provided are: a cylindrical base which is capable of uniformly transferring a fine pattern; a master plate; and a method for producing a master plate. A cylindrical base (11) which is formed of a cylindrical quartz glass material and has an internal strain of less than 70 nm / cm in terms of birefringence amount is used. A resist layer is formed on the outer circumferential surface of this cylindrical base (11), and a latent image is formed in the resist layer. The resist layer provided with the latent image is developed, and etching is carried out using the developed pattern of the resist layer as a mask. Consequently, there is formed a structure (12) that is configured of a plurality of recessed portions or projected portions, which are arranged on the outer circumferential surface of the cylindrical base (11).

Description

technical field [0001] The present invention relates to a cylindrical base material, a master disc and a method for manufacturing the master disc for transferring a fine pattern to a photocurable resin or the like. This application claims priority based on Japanese Patent Application No. Japanese Patent Application No. 2013-264358 for which it applied in Japan on December 20, 2013, and this application is referred, and is used for this application here. Background technique [0002] Conventionally, an optical element using a translucent base material such as glass or plastic has been subjected to surface treatment for suppressing surface reflection of light. As such a surface treatment, there is a method of forming fine concavo-convex shapes (for example, moth-eye (moth-order) shapes.) on the surface of an optical element (for example, refer to Patent Documents 1 and 2.). [0003] These techniques enable low-cost mass production by transferring the pattern of the master ont...

Claims

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Application Information

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IPC IPC(8): C03B20/00B29C33/38B29C59/04G03F7/004G03F7/09G11B7/26B29L11/00
CPCB29C33/38B29C33/3842B29C33/424B29C35/0805B29C35/0888B29C41/28B29C59/04B29C59/046B29D11/0074G03F7/0002G03F7/24B29L2011/00B29K2909/08G11B7/261C03C15/00C03C2218/34
Inventor 村本穣菊池正尚梶谷俊一音羽孝聪高桥康弘
Owner DEXERIALS CORP