Silicon carbide pin buried layer structure isotope cell using alpha radiation source and manufacturing method thereof
An isotope battery and alpha radiation source technology, applied in the field of silicon carbide PIN buried layer structure isotope battery and its manufacturing, can solve the problems of large series resistance of devices, affecting conversion efficiency, and difficulty in fully absorbing irradiated carriers. The effect of increasing open circuit voltage, reducing series resistance, improving output power and energy conversion efficiency
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment Construction
[0033] The present invention will be further explained below in conjunction with specific embodiments and the drawings in the specification.
[0034] See figure 1 , A silicon carbide PIN buried layer structure isotope battery using alpha radiation source, including a SiC substrate 1, a first N-type SiC epitaxial layer 2, a P-type SiC epitaxial layer 3, and a second N-type SiC substrate, which are sequentially arranged from bottom to top SiC epitaxial layer 4, the thickness of the second N-type SiC epitaxial layer 4 is 5 μm to 15 μm, the thickness of the first N-type SiC epitaxial layer 2 is 10 μm to 30 μm; the thickness of the P-type SiC epitaxial layer 3 is 0.5 μm to 5 μm;
[0035] The second N-type SiC epitaxial layer 4 is provided with a number of steps. The height of the steps on the second N-type SiC epitaxial layer 4 is 5 μm to 15 μm, the step width is 10 μm to 20 μm, and the distance between the steps is 2 μm to 5 μm. A trench is provided between adjacent steps, and the bott...
PUM
Login to View More Abstract
Description
Claims
Application Information
Login to View More 


