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Photoresist recovery system and method thereof

A technology of photoresist and recovery system, which is applied in the direction of photoplate making process coating equipment, etc., can solve the problems of increased production cost, waste of photoresist liquid, and decreased competitiveness, so as to reduce waste and reduce production cost and reduction in replacement times

Inactive Publication Date: 2016-04-13
POWERCHIP TECH CORP
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  • Summary
  • Abstract
  • Description
  • Claims
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AI Technical Summary

Problems solved by technology

However, in order to get rid of the excess air bubbles generated in the photoresist bottle and pipeline, or to replace the photoresist solution remaining in the photoresist bottle, the remaining photoresist solution remains The amount can no longer be used in production, resulting in the waste of photoresist solution
Over time, it has caused an increase in production costs and a decline in competitiveness

Method used

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  • Photoresist recovery system and method thereof
  • Photoresist recovery system and method thereof
  • Photoresist recovery system and method thereof

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Embodiment Construction

[0054] Embodiments of the invention are described more fully hereinafter with reference to the accompanying drawings. However, the present invention may be practiced in many different forms and is not limited to the embodiments set forth herein. The directional terms mentioned in the following embodiments, such as "upper", etc., are only referring to the directions of the accompanying drawings, so the directional terms used are for explaining the description rather than limiting the present invention. In addition, the size and relative size of each layer may be exaggerated for the sake of clarity in the drawings.

[0055]Hereinafter, a photoresist recovery system according to an embodiment of the present invention will be described. The embodiments of the present invention are illustrated by taking the application in photoresist coating manufacturing process equipment as an example, but it is not limited thereto.

[0056] figure 1 It is a structural configuration diagram of...

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Abstract

The invention discloses a photoresist recovery system and method thereof. The photoresist recovery system includes: a storage bottle used for storing a photoresist liquid and having a bottle cover on which a first joint, a second joint and a third joint are arranged; a pressurization device connected with the first joint; a discharge pipeline connected with the second joint of the bottle cover; a first switching device arranged on the discharge pipeline; a second switching device arranged on the discharge pipeline between the storage bottle and the first switching device; a recovery pipeline connecting the discharge pipeline between the first switching device and the second switching device; and a third switching device arranged on the recovery pipeline.

Description

technical field [0001] The invention relates to a reagent recovery system and a method thereof in a semiconductor manufacturing process, and in particular to a photoresist recovery system and a method thereof. Background technique [0002] In the semiconductor manufacturing process, various liquids are often used for different manufacturing processes, for example, a photoresist solution (photoresist, PR for short) is used in the photolithography manufacturing process. Wherein, during the photoresist coating step of the photolithography manufacturing process, the photoresist solution is applied to the wafer (wafer) by methods such as spin coating, screen printing or jet printing. superior. [0003] When the photoresist is actually delivered to the machine, there are often some problems, which affect the yield and cost of the entire product. For example, when the photoresist liquid in the photoresist bottle is lower than a certain stock, the photoresist liquid cannot be sent...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/16
Inventor 谢国信罗健宾
Owner POWERCHIP TECH CORP
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