Unlock instant, AI-driven research and patent intelligence for your innovation.

A high sustaining voltage esd protection device with pmos triggering ldmos-scr structure

An LDMOS-SCR, ESD protection technology, applied in the direction of electric solid devices, electrical components, semiconductor devices, etc., can solve the problems of insufficient latch-up resistance, low maintenance voltage, etc., to achieve the effect of ESD protection and increase maintenance voltage

Active Publication Date: 2018-05-08
JIANGNAN UNIV
View PDF5 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] In view of the ubiquitous problems of low sustaining voltage and insufficient latch-up resistance in existing high-voltage ESD protection devices, an example of the present invention designs a high-maintaining voltage ESD protection device with a PMOS-triggered LDMOS-SCR structure, which not only makes full use of The characteristics of the strong current discharge capability of the LDMOS-SCR device, and the strong voltage clamping capability of the embedded PMOS structure

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A high sustaining voltage esd protection device with pmos triggering ldmos-scr structure
  • A high sustaining voltage esd protection device with pmos triggering ldmos-scr structure
  • A high sustaining voltage esd protection device with pmos triggering ldmos-scr structure

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0017] Below in conjunction with accompanying drawing and specific embodiment the present invention will be described in further detail:

[0018] The example of the present invention designs a high-maintenance voltage ESD protection device with a PMOS-triggered LDMOS-SCR structure, which not only makes full use of the characteristics of the large current discharge capability of the LDMOS-SCR device, enhances the ESD robustness of the device, but also utilizes the built-in PMOS The structure can increase the maintenance voltage of the device and reduce the trigger voltage of the device. By adjusting key layout dimensions, high-voltage ESD protection in power integrated circuit products with different requirements can be realized without latch-up effect.

[0019] Such as figure 1 The cross-sectional view of the internal structure of the shown example device of the present invention is a high sustaining voltage ESD protection device with a PMOS trigger LDMOS-SCR structure, mainl...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention provides a high-maintaining voltage ESD protection device with a PMOS-triggered LDMOS-SCR structure. The high-maintaining voltage ESD protection device can be applied to an on-chip IC high-voltage ESD protection circuit, and mainly comprises a P substrate, an N well, a P well, a first P+ injection region, a second P+ injection region, N+ injection regions, a third P+ injection region, a fourth P+ injection region, a metal anode, a metal cathode, polysilicon gates, thin-gate oxidation layers and a plurality of field-oxide isolation regions. According to the ESD protection device with the LDMOS-SCR structure, under the high-voltage ESD pulse action, on one hand, a PMOS discharge path comprising the third P+ injection region, the second polysilicon gate, the thin-gate oxidation layer covered by the second polysilicon gate, the N well and the fourth P+ injection region improves the maintaining voltage of the device and reduces a trigger voltage of the device; and on the other hand, the fourth P+ injection region, the N well, the P well and the second P+ injection region form an ESD current discharge path with a PNPN structure, so that a secondary failure current of the device is improved; and the ESD robustness of the device is strengthened.

Description

technical field [0001] The invention belongs to the field of electrostatic discharge protection of integrated circuits and relates to a high-voltage ESD protection device, in particular to a high-maintenance-voltage ESD protection device with a PMOS-triggered LDMOS-SCR structure, which is used to improve the reliability of on-chip IC high-voltage ESD protection. Background technique [0002] In people's daily life, electrostatic phenomena (ESD) are ubiquitous. And with the rapid development of integrated circuits, electrostatic discharge has become an increasingly serious threat to the reliability of electronic product systems during the production, packaging, testing, storage, and transportation of integrated circuits. The failure of integrated circuit products caused by electrostatic discharge has become an electronic One of the most important factors in the decline of product system reliability. On the other hand, with the rapid development of power integrated circuit te...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): H01L27/02
CPCH01L27/0266H01L27/027
Inventor 顾晓峰毕秀文梁海莲
Owner JIANGNAN UNIV