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Washing device and washing method for mask and evaporation equipment

A technology for cleaning devices and masks, applied in liquid cleaning methods, cleaning methods and utensils, vacuum evaporation plating, etc., can solve problems such as waste of resources, environmental pollution, FMM damage, etc., to avoid external pollution and save Time and resource costs, effects of avoiding mask damage

Active Publication Date: 2016-05-04
BOE TECH GRP CO LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The technical problem to be solved by the present invention is the problems of FMM damage, waste of resources and environmental pollution caused by cleaning methods such as organic solvents and high-temperature vaporization in the prior art

Method used

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  • Washing device and washing method for mask and evaporation equipment
  • Washing device and washing method for mask and evaporation equipment
  • Washing device and washing method for mask and evaporation equipment

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0030] Such as image 3 As shown, this embodiment provides a mask cleaning device, which includes an oscillating device 7, wherein the oscillating device 7 is arranged on the mask 2, and the oscillating device 7 is used after the mask 2 is evaporated (in The organic luminescent material is vaporized and deposited behind the substrate 1 and the mask 2) to apply a vibrating force to the mask 2 to make the residual material on the mask 2 fall off. The mask 2 can be a fine metal mask (FMM). It can be seen that the cleaning device in this embodiment can effectively avoid problems such as damage to the mask plate 2, waste of resources, and environmental pollution caused by cleaning methods such as organic solvents and high-temperature vaporization. In addition, the use of vibration cleaning can also avoid the introduction of external pollution, and the recycled materials can be reused, which greatly saves time and resource costs, and is suitable for the development direction of gre...

Embodiment 2

[0038] This embodiment provides an evaporation equipment, which includes the mask cleaning device described in Embodiment 1, the mask cleaning device includes an oscillating device 7, and the oscillating device 7 is arranged on the mask 2. After the stencil 2 is vapor-deposited, a vibration force is applied to the mask 2 to make the residual material on the mask 2 fall off. In order to achieve a better cleaning effect, the cleaning device for the mask plate also includes an electrostatic adsorption device, which absorbs the residual material on the mask plate 2 through the generated static electricity. The electrostatic adsorption device can be used together with the oscillating device 7, so that the residual organic material can be further separated under the joint action of electrostatic force and gravity, and the cleaning effect can be better improved.

[0039]Specifically, the evaporation equipment includes an evaporation chamber 4 and a substrate 1 with a backplane circui...

Embodiment 3

[0041] This embodiment provides a method for cleaning the mask 2, which includes the following steps: after the evaporation is completed using the mask 2, applying vibration force to the mask 2 by adjusting the vibration intensity and frequency of the oscillation device 7, Remove residual material on mask 2. The mask plate cleaning device can perform cleaning operations on fine metal mask plates. The oscillating device 7 is preferably an ultrasonic oscillator, and the ultrasonic oscillator is arranged at the side of the mask plate 2, that is to say, an ultrasonic oscillator is respectively arranged on the four sides of the mask plate 2, and by adjusting the different ultrasonic oscillators Vibration intensity can focus on detaching the residual material on the mask plate 2 . It can be seen that the ultrasonic oscillator can provide vibration energy to the mask plate 2, and the detachment speed of the organic material can be adjusted by changing the vibration intensity and fre...

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Abstract

The invention relates to the technical field of display, in particular to a washing device and washing method for a mask and evaporation equipment. The washing device for the mask comprises a vibration device which is arranged on the mask. The vibration device exerts vibratory force on the mask when evaporation of the mask is completed, so that residual materials on the mask fall off. In addition, the washing device for the mask further comprises an electrostatic adsorption device which adsorbs the residual materials on the mask through generated static electricity. According to the washing device and washing method for the mask and the evaporation equipment, through the organic light-emitting material washing method achieved by an ultrasonic vibration principle, the problems such as mask damage, resource waste and environmental pollution caused by washing methods such as an organic solvent washing method and a high-temperature vaporization washing method can be effectively avoided. In addition, through ultrasonic vibration washing, external pollution can further be prevented from being led in so that the recycled materials can be reused, accordingly the time and resource cost is greatly reduced, and the washing method is suitable for the development directions of green production and large-scale mass production.

Description

technical field [0001] The invention relates to the field of display technology, in particular to a mask plate cleaning device, cleaning method, and evaporation equipment. Background technique [0002] Such as figure 1 As shown, the existing evaporation equipment usually consists of four parts: a substrate 1 with a backplane circuit, a fine metal mask (FMM) 2 , a crucible 3 and an evaporation chamber 4 . During the evaporation process, as attached figure 2 As shown, adding high temperature to the crucible 3 can vaporize the organic luminescent material 5 and deposit it on the substrate 1 and the fine metal mask 2 , thereby forming a solid organic luminescent material 5 . Due to the condition of mass production, a fine metal mask needs to be reused many times, in order to avoid contamination and color mixing, FMM needs to be cleaned after each use. [0003] There are generally two conventional FMM cleaning methods: one is to heat the FMM as a whole, and the heat evaporate...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B08B3/12B08B13/00C23C14/56
CPCB08B3/12B08B13/00C23C14/56B08B7/02C23C14/042C23C14/564C23C14/24C23C14/04
Inventor 王强刘利宾
Owner BOE TECH GRP CO LTD