Monitoring network based on nano-structured sensing devices

A nanostructure and detector technology that can be used in nanostructure fabrication, measurement devices, nanotechnology, etc., to solve problems such as difficulty in reproducibly demonstrating enhancement levels

Active Publication Date: 2014-01-22
OPTOTRACE SUZHOU TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

All experiments including Intel's work can be repeated by other groups, but it is difficult to demonstrate the same level of enhancement reproducibly

Method used

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  • Monitoring network based on nano-structured sensing devices
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  • Monitoring network based on nano-structured sensing devices

Examples

Experimental program
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specific Embodiment approach

[0116] The invention will be further described in the following examples without limiting the scope of the invention described in the claims.

example 1

[0118] Fabrication of nanosurface arrays by anodic oxidation

[0119] Thin films of Ti (about 100 nm) were deposited by electron beam evaporation of silicon (100) wafers, followed by deposition of Ag (about 100 nm). A layer of about 500 nm Al was then deposited on top of the Ag film using physical vapor deposition.

[0120] The coated Si wafer was then put into an anodic oxidation plating bath with about 0.3M oxalic acid solution as electrolytic solution. The electroplating bath was maintained at about 10°C, and the anodizing voltage was set at about 35V. After anodization, nanometer-sized narrow pores in the Al 2 o 3 formed in the layer. The diameter of the pores (or holes) can be widened by placing the wafer in about 10 wt.% phosphoric acid solution. Al 2 o 3 The nanoporous structure in the layer acts as a mask for etching the active metal layer or depositing the active metal layer. In this way, nanosurface arrays were formed after removal of the oxidized Al layer. ...

example 2

[0122] Nanoimprint lithography for fabrication of nanosurface arrays

[0123] The first step in nanoimprinting is to imprint a mold into a thin resist cast on a substrate. The purpose of this step is to replicate the nanostructures on the mold into the resist film. The second step is to etch the resist film to form nanostructures on the substrate.

[0124] Using electron beam lithography and reactive ion etching (RIE) on a Si wafer, the mold was patterned with an array of nanodots with a feature size of 30 nm. PMMA was used as resist on Au-coated Si(100) wafers. A thin Ti layer is inserted between Au and Si to enhance adhesion. The imprinting process is carried out in a vacuum at a pressure of about 1000 Pascals (psi) at about 160 °C above the glass transition temperature of PMMA. After the pattern from the mold was transferred to the Au-coated Si (100), oxidative reactive ion etching (RIE) was used to remove the residual resist in the PMMA pinched areas. Then, the patter...

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Abstract

A monitoring network system for inspecting and controlling harmful substances includes probe assemblies that each includes a sensor comprising nano structured surfaces or nano particles in a solution, configured to adsorb molecules of a sample material captured adjacent to the sensor, a laser that can emit a laser beam to illuminate the molecules adsorbed to the nano structured surfaces, a spectrometer that can produce spectral data from light scattered by the molecules adsorbed to the nano structured surfaces, and a ID reader that can retrieve identification information about the sample material. A central office can determine a spectral signature matching spectral signatures stored in a database and to identify a harmful substance in the sample material. An alert and response system can send out an alert signal about the sample material when the harmful substance is identified in the sample material.

Description

[0001] Cross References to Related Applications [0002] This application is a continuation-in-part (CIP) of, and claims priority from, commonly assigned co-pending U.S. Patent Application No. 12 / 502,903, entitled "Using Surface Enhanced Mann scattering nanostructure detection device", the filing date is July 14, 2009. Pending U.S. Patent Application No. 12 / 502,903 claims priority to U.S. Patent Application No. 12 / 262,667, entitled "Nanostructure Arrays for Surface-Enhanced Raman Scattering," application The date is October 31, 2008. US Patent Application No. 12 / 262,667 claims priority to US Patent Application No. 11 / 562,409, filed November 21, 2006 (issued as US Patent No. 7,460,224). US Patent Application No. 11 / 562,409 further claims priority to US Provisional Patent Application No. 60 / 751,472, filed December 19, 2005. This application is a continuation-in-part (CIP) of and claims priority to commonly assigned co-pending U.S. Patent Application No. 12 / 625,970, entitled "S...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01N21/65B82B3/00
CPCB82Y20/00B82Y40/00G01N21/658G01N33/54346G01N2021/3196
Inventor 汪泓刘春伟郭浔
Owner OPTOTRACE SUZHOU TECH
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