Gas inlet equipment for chemical vapor deposition reactor of fluidized bed
A technology of chemical vapor deposition and gas inlet, which is applied in the direction of gaseous chemical plating, metal material coating process, coating, etc., and can solve the problems that cannot be completely removed, deposition products are difficult to completely remove, and affect the process, etc.
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[0037] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.
[0038] figure 1 is a schematic cross-sectional view of a gas inlet device according to an embodiment of the present invention. Such as figure 1 As shown, the gas inlet device of an embodiment of the present invention includes: a middle gas pipeline, one end of which is arranged in the reactor, and is used to pass the gas to be cracked into the reactor; The circulating water jacket 1 is used to cool the middle gas pipeline, wherein the middle gas pipeline pas...
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