Inspection method for scribe groove structure design in mask design

A technology of structural design and inspection method, which is applied in calculation, instrumentation, electrical digital data processing, etc., can solve the problems of photolithographic alignment test pattern leakage, failure to ensure correctness, and time-consuming, etc., to shorten the inspection time , easy to batch process, and reduce the effect of error rate

Active Publication Date: 2019-03-26
SHANGHAI HUAHONG GRACE SEMICON MFG CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

According to the existing inspection method, engineers need to compare the inspection table with the actual data, which takes a lot of time and is prone to errors, resulting in missing photolithography alignment or test patterns, and cannot guarantee correctness

Method used

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  • Inspection method for scribe groove structure design in mask design
  • Inspection method for scribe groove structure design in mask design
  • Inspection method for scribe groove structure design in mask design

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Embodiment Construction

[0032] Such as figure 1 As shown, it is a flow chart of the method of the embodiment of the present invention; the inspection method of the design of the scribe groove structure in the mask plate design of the embodiment of the present invention includes the following steps:

[0033] Step 1. Develop a corresponding standard configuration file for each process, and the standard configuration file is provided with information of all alignment marks or test patterns of the scribing grooves of the corresponding process. Developing the corresponding standard configuration file for each process includes the following steps:

[0034] Step 11, determining the minimum and maximum number of metal layers supported by the corresponding process. For example, the corresponding process name is CZ6H, the lowest is 2 layers of aluminum, and the highest is 4 layers of aluminum.

[0035] Step 12. Determine how many optional levels, that is, option marks, the corresponding process contains. Fo...

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Abstract

The invention discloses a detection method of a scribe line structure design in a mask plate design. The method comprises following steps: preparing technological standard configuration files; leading each standard configuration file to a database for storage; designing a mask plate according to an actual technological demand, after finishing designing, extracting the layout data of a scribe line structure to be detected through a graphical user interface mode, analyzing the information of each kind of alignment marks and test graphs of the layout data of the scribe line structure, selecting corresponding standard configuration files from the database, comparing the analyzed information of each kind of alignment marks and test graphs with the information of the alignment marks in the standard configuration files, outputting a detection result; analyzing and storing the detection result; and confirming whether the scribe line structure design is qualified through analyzing the detection result. According to the method of the invention, the detection time can be shortened, the working efficiency can be improved, and the error rate can be effectively reduced.

Description

technical field [0001] The invention relates to a manufacturing process method of a semiconductor integrated circuit, in particular to a method for inspecting the structure design of a scribe groove in the design of a mask plate. Background technique [0002] Scribing groove structure design is the design carried out after the product design data input inspection in the mask design business, and before EB processing and mask making, where EB processing generates data for mask making for layer calculation. It is mainly based on the size specification of the mask plate and the layout design of the cutting line according to the size of the chip. At the same time, various lithography alignment and testing graphics required by the product engineering are placed on the cutting line, and finally the pattern before the mask plate is produced is generated. Final layout data. [0003] As the number of processes involved in the mask design business continues to increase, checking that...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G06F17/50
Inventor 张燕荣张兴洲
Owner SHANGHAI HUAHONG GRACE SEMICON MFG CORP
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