Manufacturing method for aluminum targets

A manufacturing method and aluminum target technology, applied in metal material coating process, ion implantation plating, coating, etc., can solve the problems that cannot meet the use requirements of high-generation TFT-LCD panels

Active Publication Date: 2016-06-01
合肥江丰电子材料有限公司
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Problems solved by technology

[0004] However, the existing manufacturing methods of aluminum targets

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  • Manufacturing method for aluminum targets
  • Manufacturing method for aluminum targets
  • Manufacturing method for aluminum targets

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Embodiment Construction

[0027] The existing manufacturing method of aluminum target usually requires three heat treatments. However, when the existing heat treatment methods are aimed at the aluminum targets above the 6th generation line, they often cannot meet the corresponding processing requirements. This is because the size of the aluminum target used in the TFT-LCD panel above the 6th generation line is relatively large, and it is often difficult to control the temperature uniformity of the aluminum target in the heat treatment furnace. For example, the aluminum target area of ​​the 8.5-generation line is 2650mm×210mm. In the existing matching heat treatment furnace, the temperature transmitted from the furnace temperature to the various directions of the aluminum target is often different. In addition, for TFT-LCD panels above the 6th generation line, when forming aluminum wiring on the glass substrate, it is necessary to use multiple aluminum targets at the same time to sputter together. For ...

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Abstract

The invention discloses a manufacturing method for aluminum targets. The manufacturing method comprises the steps that aluminum ingots are provided; the aluminum ingots are subjected to first heat treatment; the aluminum ingots are forged to form first aluminum target blanks after the first heat treatment; the first aluminum target blanks are subjected to second heat treatment; the first aluminum target blanks are rolled to form second aluminum target blanks after the second heat treatment; at least two second aluminum target blanks are made to make contact with each other; and the second aluminum target blanks which make contact are simultaneously subjected to third heat treatment to form the aluminum targets. According to the manufacturing method, the uniformity of grain sizes of different aluminum targets formed through the method is improved, the production efficiency is improved and the production cost is reduced.

Description

technical field [0001] The invention relates to the field of manufacturing liquid crystal panels, in particular to a method for manufacturing an aluminum target. Background technique [0002] The wiring used by thin film field effect transistor liquid crystal display (TFT-LCD) panel factories above the 6th generation line is usually aluminum wiring. Aluminum wiring is usually formed by physical vapor deposition technology, that is, a film layer is usually formed by sputtering an aluminum target, and then an etching process is used to etch the film layer to form aluminum wiring. [0003] Aluminum targets are usually made of pure aluminum. The production process of the existing aluminum target usually includes providing an aluminum ingot, performing the first heat treatment on the aluminum ingot, and then forging the aluminum ingot after the first heat treatment to form the first aluminum target blank, and then performing the first aluminum ingot The target blank is subjecte...

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Application Information

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IPC IPC(8): C22F1/04C23C14/34
Inventor 姚力军潘杰相原俊夫大岩一彦王学泽吴旌
Owner 合肥江丰电子材料有限公司
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